SCHEMBL633164

SCHEMBL633164

CC=CC(=O)Oc1ccc(N=C=O)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.39
TSHR P16473 1/20 0.39
ELANE P08246 1/20 0.38
KMT2A Q03164 3/20 0.37
CA2 P00918 1/20 0.36
TRPA1 O75762 1/20 0.35
MAOB P27338 2/20 0.34
MAPK1 P28482 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
PRSS1 P07477 3/20 0.33
F2 P00734 1/20 0.33
PRSS2 P07478 1/20 0.33
PRSS3 P35030 1/20 0.33
RAB9A P51151 1/20 0.32
POLB P06746 1/20 0.32
ACR P10323 3/20 0.32
HGFAC Q04756 1/20 0.32
MEN1 O00255 1/20 0.32
MAPT P10636 1/20 0.32
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL632538 0.79 THRB (0.47) CYP3A4TSHRELANEKMT2ATRPA1
SCHEMBL3420578 0.79 LMNA (0.53) CYP3A4TSHRELANEKMT2ATRPA1
SCHEMBL20577757 0.76 HSD17B10 (0.46) KMT2ACA2MAOBRAB9APOLB
SCHEMBL8620443 0.75 KMT2A (0.62) CYP3A4KMT2ACA2MEN1MAPT
SCHEMBL8620440 0.75 KMT2A (0.62) CYP3A4KMT2ACA2MEN1MAPT
SCHEMBL3320371 0.75 CYP3A4 (0.44) CYP3A4TSHRELANETRPA1MAPK1
SCHEMBL28032702 0.75 CYP3A4 (0.44) CYP3A4TSHRELANEKMT2AMAPK1
SCHEMBL3308648 0.75 KMT2A (0.54) CYP3A4TSHRELANEKMT2ARAB9A
SCHEMBL10694032 0.74 CA2 (0.41) ELANEKMT2ACA2MAOBTDP1
SCHEMBL10694037 0.74 ELANE (0.46) ELANEKMT2ACA2TDP1RAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 87 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120205234-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2012-08-16 US claimed
US-20100099827-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2010-04-22 US claimed
EP-2091994-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION Showa Denko K.K. (JP) 2009-08-26 EP claimed
WO-2008069256-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2008-06-12 WO claimed
EP-4660705-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT Toray Industries, Inc. (JP) 2025-12-10 EP disclosed
WO-2025084057-A1 METHOD FOR PRODUCING MONOMER PRECURSOR COMPOSITION 東レ株式会社 2025-04-24 WO disclosed
WO-2024162116-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT 東レ株式会社 2024-08-08 WO disclosed
WO-2024117161-A1 BLOCKED ISOCYANATE COMPOSITION, (CO)POLYMER, COATING MATERIAL, CURED PRODUCT, AND COATING FILM 株式会社レゾナック 2024-06-06 WO disclosed
WO-2024034518-A1 POLYMER EMULSION, AND SINGLE-LIQUID TYPE THERMOSETTING RESIN COMPOSITION, TWO-LIQUID TYPE THERMOSETTING RESIN COMPOSITION, COATING MATERIAL, RESIN CURED FILM, AND COATING FILM USING SAID POLYMER EMULSION 株式会社レゾナック 2024-02-15 WO disclosed
US-11891472-B2 Composition, production method for composition, and production method for unsaturated compound RESONAC CORPORATION (JP) 2024-02-06 US disclosed
EP-3842417-B1 COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND RESONAC CORP (JP) 2024-01-24 EP disclosed
WO-2023120364-A1 POLYMER EMULSION, STORAGE METHOD THEREFOR, TWO-PACK TYPE HEAT-CURABLE RESIN COMPOSITION USING SAID POLYMER EMULSION, CURED RESIN FILM, AND COATING FILM 株式会社レゾナック 2023-06-29 WO disclosed
EP-1713787-B1 (METH) ACRYLOYL GROUP-CONTAINING OXETANE COMPOUND AND PRODUCTION METHOD THEREOF SHOWA DENKO KK (JP) 2009-12-30 EP disclosed
EP-2091994-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION Showa Denko K.K. (JP) 2009-08-26 EP disclosed
EP-2055726-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Showa Denko K.K. (JP) 2009-05-06 EP disclosed
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof SHOWA DENKO K.K. (JP) 2009-02-26 US disclosed
WO-2008069256-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2008-06-12 WO disclosed
EP-1866357-A1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF Showa Denko K.K. (JP) 2007-12-19 EP disclosed
US-20070060760-A1 (Meth) acryloyl group-containing oxetane compound and production method thereof SHOWA DENKO K.K. (JP) 2007-03-15 US disclosed
WO-2006103979-A1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 2006-10-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof PRMT5, ACR, PRMT1 CYP3A4 491/4885TSHR 3178/4885ELANE 3333/4885
US-20070060760-A1 (Meth) acryloyl group-containing oxetane compound and production method thereof OXGR1, ALKBH2, OXER1 CYP3A4 123/4885TSHR 2809/4885ELANE 4218/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.