SCHEMBL633251

SCHEMBL633251

C=CC(=O)Oc1cccc(N=C=O)c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.37
MEN1 O00255 3/20 0.37
THRB P10828 4/20 0.36
MAPK1 P28482 2/20 0.35
TDP1 Q9NUW8 2/20 0.35
EGFR P00533 2/20 0.35
THRA P10827 1/20 0.34
CYP3A4 P08684 3/20 0.33
LMNA P02545 1/20 0.33
ACHE P22303 1/20 0.33
TRPA1 O75762 1/20 0.33
TYMS P04818 1/20 0.33
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.33
BLM P54132 1/20 0.33
MCL1 Q07820 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
TP53 P04637 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14689870 0.87 KMT2A (0.41) KMT2AMEN1THRBMAPK1TDP1
SCHEMBL14689871 0.87 KMT2A (0.41) KMT2AMEN1THRBMAPK1TDP1
SCHEMBL20183951 0.86 MIF (0.39) KMT2AMEN1THRBTDP1EGFR
SCHEMBL28033164 0.81 KMT2A (0.61) KMT2AMEN1MAPK1TDP1CYP3A4
SCHEMBL27464310 0.81 MAPK1 (0.41) KMT2AMEN1MAPK1TDP1CYP3A4
SCHEMBL632538 0.80 THRB (0.47) KMT2ATHRBMAPK1TDP1THRA
SCHEMBL421454 0.79 KMT2A (0.56) KMT2AMEN1THRBMAPK1TDP1
SCHEMBL633163 0.79 ELANE (0.43) KMT2AMEN1MAPK1TDP1CYP3A4
SCHEMBL28520567 0.78 ALDH1A1 (0.39) KMT2AMEN1THRBMAPK1TDP1
SCHEMBL11416323 0.77 ACHE (0.48) THRBMAPK1CYP3A4LMNAACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 94 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4660705-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT Toray Industries, Inc. (JP) 2025-12-10 EP disclosed
CN-114929668-B (Meth) acrylate compound having isocyanate group and method for producing same 株式会社力森诺科 2024-08-20 CN disclosed
WO-2024162116-A1 NEGATIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING RELIEF PATTERN USING SAME, CURED ARTICLE AND ELECTRONIC COMPONENT 東レ株式会社 2024-08-08 WO disclosed
CN-118210200-A Photosensitive resin composition, cured film pattern, and method for producing same 奇美实业股份有限公司 2024-06-18 CN disclosed
US-11891472-B2 Composition, production method for composition, and production method for unsaturated compound RESONAC CORPORATION (JP) 2024-02-06 US disclosed
EP-3842417-B1 COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND RESONAC CORP (JP) 2024-01-24 EP disclosed
CN-116583498-A Blocked isocyanate compound 株式会社力森诺科 2023-08-11 CN disclosed
US-11661474-B2 Composition, production method for composition, and production method for unsaturated compound SHOWA DENKO K.K. (JP) 2023-05-30 US disclosed
EP-3842414-B1 COMPOSITION, PRODUCTION METHOD FOR COMPOSITION, AND PRODUCTION METHOD FOR UNSATURATED COMPOUND SHOWA DENKO KK (JP) 2023-04-05 EP disclosed
CN-112533896-B Composition, method for producing composition, and method for producing unsaturated compound 昭和电工株式会社 2023-03-03 CN disclosed
US-20100047713-A1 CURABLE COMPOSITION CONTAINING HYDROXYTHIOL COMPOUND, AND CURED PRODUCTS THEREOF SHOWA DENKO K.K. (JP) 2010-02-25 US disclosed
EP-2091994-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION Showa Denko K.K. (JP) 2009-08-26 EP disclosed
EP-2088163-A1 CURABLE COMPOSITION CONTAINING HYDROXYL GROUP-CONTAINING THIOL COMPOUND AND CURED PRODUCT THEREOF Showa Denko K.K. (JP) 2009-08-12 EP disclosed
CN-101506252-A Thiourethane compound and photosensitive resin composition SHOWA DENKO KK (JP) 2009-08-12 CN disclosed
EP-2055726-A1 THIOURETHANE COMPOUND AND PHOTOSENSITIVE RESIN COMPOSITION Showa Denko K.K. (JP) 2009-05-06 EP disclosed
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof SHOWA DENKO K.K. (JP) 2009-02-26 US disclosed
WO-2008069256-A1 POLYMERIZABLE MONOMER COMPOSITION AND METHOD FOR PREVENTING POLYMERIZATION SHOWA DENKO K.K. (JP) 2008-06-12 WO disclosed
CN-101142252-A Aromatic isocyanate compound containing (meth) acryloyl group and method for producing same SHOWA DENKO KK (JP) 2008-03-12 CN disclosed
EP-1866357-A1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF Showa Denko K.K. (JP) 2007-12-19 EP disclosed
WO-2006103979-A1 (METH)ACRYLOYL GROUP-CONTAINING AROMATIC ISOCYANATE COMPOUND AND PRODUCTION PROCESS THEREOF SHOWA DENKO K.K. (JP) 2006-10-05 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090054543-A1 (Meth) Acryloyl Group-Containing Aromatic Isocyanate Compound and Production Process Thereof PRMT5, ACR, PRMT1 KMT2A 1425/4885MEN1 742/4885THRB 3103/4885
US-11661474-B2 Composition, production method for composition, and production method for unsaturated compound ELOVL1, ACOX1, NCOA1 KMT2A 2800/4885MEN1 1216/4885THRB 1502/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.