SCHEMBL6364240

SCHEMBL6364240

[CH2]C(=O)C(CC)(CC)CC

nearest known ligand 0.32

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
CYP4F2 P78329 1/20 0.32
CYP4A11 Q02928 1/20 0.32
TDP1 Q9NUW8 2/20 0.32
ALDH1A1 P00352 2/20 0.32
FFAR3 O14843 1/20 0.32
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6363602 0.71
SCHEMBL8434912 0.71
SCHEMBL8074334 0.69 ALDH1A1 (0.41) CYP4F2CYP4A11TDP1ALDH1A1FFAR3
SCHEMBL173322 0.69 FFAR3 (0.41) CYP4F2CYP4A11TDP1ALDH1A1FFAR3
SCHEMBL899422 0.69 TDP1 (0.33) CYP4F2CYP4A11TDP1ALDH1A1FFAR3
SCHEMBL6449919 0.67 TET2 (0.34) FFAR3TSHR
SCHEMBL7869640 0.67
SCHEMBL9142384 0.67 CYP4F2 (0.38) CYP4F2CYP4A11
SCHEMBL6764293 0.67 TSHR (0.43) TDP1ALDH1A1TSHR
SCHEMBL6847171 0.67 ALDH1A1 (0.39) CYP4F2CYP4A11TDP1ALDH1A1FFAR3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6849384-B2 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions NEC CORPORATION (JP) 2005-02-01 US disclosed
US-6638685-B2 Resolution, sensitivity and smoothness on side surfaces of a transferred pattern; photolithography NEC CORPORATION (JP) 2003-10-28 US disclosed
US-20030198889-A1 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions NEC CORPORATION (JP) 2003-10-23 US disclosed
US-6602647-B2 Photo acid generator with high transparency and excellent heat stability in a photoresist for lithography using far ultraviolet light, especially light of ArF excimer consists of a cyclic sulfonium compound with 2-oxo group NEC CORPORATION (JP) 2003-08-05 US disclosed
US-20020182535-A1 Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method NEC CORPORATION (JP) 2002-12-05 US disclosed
US-20020045122-A1 Sulfonium salt compound and resist composition and pattern forming method using the same NEC CORPORATION 2002-04-18 US disclosed
EP-1113334-A1 Sulfonium salt compound, resist composition comprising the same and pattern forming method using the composition NEC CORPORATION (JP) 2001-07-04 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20030198889-A1 Photoacid generators, photoresist compositions containing the same and pattering method with the use of the compositions PPOX, SULT1A1, TST CYP4F2 1392/4885CYP4A11 1556/4885TDP1 3934/4885
US-20020182535-A1 Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method ASIC1, ASIC3, SULT1A1 CYP4F2 4229/4885CYP4A11 3431/4885TDP1 2782/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.