SCHEMBL6557356

SCHEMBL6557356

Cc1cc(C)c(S(=O)(=O)Cl)c(C)c1S(=O)(=O)Cl.Sc1ccc(S)cc1

nearest known ligand 0.33

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RAPGEF4 Q8WZA2 5/20 0.33
HTT P42858 2/20 0.32
LMNA P02545 1/20 0.32
GAA P10253 1/20 0.32
MAPK1 P28482 1/20 0.32
CA1 P00915 2/20 0.31
CA2 P00918 2/20 0.31
CA12 O43570 1/20 0.31
CA4 P22748 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
CA13 Q8N1Q1 1/20 0.31
CA14 Q9ULX7 1/20 0.31
CA5B Q9Y2D0 1/20 0.31
IDO1 P14902 1/20 0.31
CYP19A1 P11511 1/20 0.31
MEN1 O00255 2/20 0.31
KMT2A Q03164 2/20 0.31
SMN1; SMN2 Q16637 2/20 0.31
MMP1 P03956 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2263745 0.87 RAPGEF4 (0.40) RAPGEF4HTTLMNAGAAMAPK1
SCHEMBL7313649 0.79 RAPGEF4 (0.38) RAPGEF4HTTLMNAGAAMAPK1
2-Mercaptoethanol SCHEMBL6558446 0.77 ALDH1A1 (0.33) RAPGEF4HTTLMNAGAAMAPK1
SCHEMBL1021882 0.73 KMT2A (0.44) RAPGEF4HTTLMNAGAAMAPK1
SCHEMBL6557490 0.73 CA12 (0.35) RAPGEF4MAPK1CA1CA2CA12
SCHEMBL4091751 0.72 TDP2 (0.39) RAPGEF4HTTLMNAGAAMAPK1
SCHEMBL28643737 0.69 ALDH1A1 (0.30) ALDH1A1
SCHEMBL23172333 0.69 CA1 (0.44) RAPGEF4GAAMAPK1CA1CA2
SCHEMBL27451540 0.69 GAA (0.46) RAPGEF4GAACA1CA2CA12
SCHEMBL7608 0.69 CA1 (0.52) RAPGEF4GAAMAPK1CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0916394-B1 Method of manufacturing modified particles and manufacturing device therefor SHARP KK (JP) 2004-03-10 EP disclosed
US-6194487-B1 EXPOSURE OF PARTICLES TO SUPERSATURATED VAPOR OF MONOMERS, CONDENSATION AND POLYMERIZATION ON THE SURFACE SHARP KABUSHIKI KAISHA (JP) 2001-02-27 US disclosed
EP-0916394-A2 Method of manufacturing modified particles and manufacturing device therefor Sharp Kabushiki Kaisha (JP) 1999-05-19 EP disclosed