SCHEMBL6557490

SCHEMBL6557490

Cc1cc(C)c(S(=O)(=O)Cl)c(C)c1S(=O)(=O)Cl.NC1CCC(N)CC1

nearest known ligand 0.37

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
CA12 O43570 1/20 0.35
CA1 P00915 1/20 0.35
CA2 P00918 1/20 0.35
CA4 P22748 1/20 0.35
CA7 P43166 1/20 0.35
CA9 Q16790 1/20 0.35
CA13 Q8N1Q1 1/20 0.35
CA14 Q9ULX7 1/20 0.35
CA5B Q9Y2D0 1/20 0.35
MEN1 O00255 4/20 0.33
KMT2A Q03164 4/20 0.33
RAPGEF4 Q8WZA2 1/20 0.32
MAPK1 P28482 1/20 0.31
F2 P00734 1/20 0.30
PRSS1 P07477 1/20 0.30
PRSS2 P07478 1/20 0.30
PRSS3 P35030 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2263745 0.84 RAPGEF4 (0.40) CA12CA1CA2CA4CA7
SCHEMBL7313649 0.76 RAPGEF4 (0.38) CA12CA1CA2CA4CA7
SCHEMBL6557356 0.73 RAPGEF4 (0.33) CA12CA1CA2CA4CA7
SCHEMBL1021882 0.71 KMT2A (0.44) MEN1KMT2ARAPGEF4MAPK1
2-Mercaptoethanol SCHEMBL6558446 0.70 ALDH1A1 (0.33) CA12CA1CA2CA4CA7
SCHEMBL9521335 0.67 L3MBTL1 (0.42) CA12CA1CA2CA4CA7
SCHEMBL28643737 0.67 ALDH1A1 (0.30)
SCHEMBL7608 0.66 CA1 (0.52) CA12CA1CA2CA4CA7
SCHEMBL248149 0.65 NMT1 (0.50) MEN1KMT2ARAPGEF4F2
SCHEMBL4091751 0.65 TDP2 (0.39) MEN1KMT2ARAPGEF4MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0916394-B1 Method of manufacturing modified particles and manufacturing device therefor SHARP KK (JP) 2004-03-10 EP disclosed
US-6194487-B1 EXPOSURE OF PARTICLES TO SUPERSATURATED VAPOR OF MONOMERS, CONDENSATION AND POLYMERIZATION ON THE SURFACE SHARP KABUSHIKI KAISHA (JP) 2001-02-27 US disclosed
EP-0916394-A2 Method of manufacturing modified particles and manufacturing device therefor Sharp Kabushiki Kaisha (JP) 1999-05-19 EP disclosed