Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL6562385

CCCOc1ccc2c([S+]3CCCC3)cccc2c1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.36

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MTNR1A P48039 2/20 0.36
CA1 P00915 2/20 0.34
CA2 P00918 2/20 0.34
CA7 P43166 2/20 0.34
CA9 Q16790 2/20 0.34
CA12 O43570 1/20 0.34
KDM4E B2RXH2 1/20 0.34
ALDH1A1 P00352 1/20 0.34
MAPT P10636 1/20 0.34
HPGD P15428 1/20 0.34
TSHR P16473 1/20 0.34
MAPK1 P28482 1/20 0.34
HSD17B10 Q99714 1/20 0.34
KAT6A Q92794 1/20 0.34
ACHE P22303 4/20 0.33
FDFT1 P37268 1/20 0.33
CA14 Q9ULX7 1/20 0.33
PDK2 Q15119 1/20 0.33
KMT2A Q03164 1/20 0.33
KCNH2 Q12809 6/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL6566112 0.92 ACHE (0.35) MTNR1AKDM4EMAPK1ACHE
Trifluoromethanesulfonic Acid SCHEMBL6563576 0.92 MTNR1A (0.42) MTNR1ACA1CA2CA7CA9
Trifluoromethanesulfonic Acid SCHEMBL6564004 0.92 GAA (0.39) MTNR1ACA1CA2CA7CA9
Trifluoromethanesulfonic Acid SCHEMBL6566405 0.89 ACHE (0.33) MTNR1AMAPK1ACHEKCNH2
Trifluoromethanesulfonic Acid SCHEMBL6565959 0.88 GAA (0.34) MAPK1KCNH2
Trifluoromethanesulfonic Acid SCHEMBL6564868 0.86 MMP2 (0.37) MTNR1AKDM4EMAPTHPGDKMT2A
Trifluoromethanesulfonic Acid SCHEMBL6564719 0.86 MTNR1A (0.39) MTNR1AACHEKMT2AKCNH2
Trifluoromethanesulfonic Acid SCHEMBL7794857 0.84 ALOX5 (0.43) CA1CA2CA7CA9CA12
Trifluoromethanesulfonic Acid SCHEMBL6564748 0.84 KMT2A (0.37) MTNR1AKDM4EMAPTHPGDKMT2A
Trifluoromethanesulfonic Acid SCHEMBL6564570 0.83 MTNR1A (0.38) MTNR1AACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed