Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.34 |
| ▸ | KCNH2 | Q12809 | 2/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6566222 | 0.92 | MTNR1A (0.35) | GAAMAPK1TDP1L3MBTL1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566405 | 0.92 | ACHE (0.33) | GAAMAPK1TDP1L3MBTL1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564004 | 0.92 | GAA (0.39) | GAAMAPK1TDP1L3MBTL1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6562385 | 0.88 | MTNR1A (0.36) | MAPK1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566112 | 0.86 | ACHE (0.35) | MAPK1TDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564719 | 0.84 | MTNR1A (0.39) | TDP1L3MBTL1KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6562415 | 0.83 | MTNR1A (0.35) | KCNH2 | |
| Trifluoromethanesulfonic Acid SCHEMBL6566367 | 0.83 | MTNR1A (0.41) | GAAMAPK1TDP1L3MBTL1 | |
| Trifluoromethanesulfonic Acid SCHEMBL7794857 | 0.83 | ALOX5 (0.43) | GAATDP1 | |
| Trifluoromethanesulfonic Acid SCHEMBL6564556 | 0.82 | CA2 (0.36) | GAAL3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |