Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL7793121

O=S(=O)([O-])C(F)(F)F.c1ccc(COc2cccc3c([S+]4CCCC4)cccc23)cc1

nearest known ligand 0.38

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Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PLAU P00749 1/20 0.38
PLAT P00750 1/20 0.38
MAPT P10636 3/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
MAPK1 P28482 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
MRGPRX4 Q96LA9 3/20 0.36
POLB P06746 2/20 0.35
PTPRZ1 P23471 1/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
MGLL Q99685 1/20 0.35
SRD5A2 P31213 1/20 0.35
FABP4 P15090 1/20 0.34
CCR8 P51685 1/20 0.34
RXRA P19793 2/20 0.34
RXRB P28702 2/20 0.34
RXRG P48443 2/20 0.34
RORC P51449 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL646415 0.94 NPC1 (0.38) PLAUPLATMAPTL3MBTL1MRGPRX4
Trifluoromethanesulfonic Acid SCHEMBL6563968 0.85 ALDH1A1 (0.39) MAPTSMN1; SMN2LMNAHPGD
Trifluoromethanesulfonic Acid SCHEMBL6564009 0.85 KDM4E (0.36) HPGD
SCHEMBL3149496 0.84 POLB (0.37) MAPTL3MBTL1MRGPRX4POLBNPC1
SCHEMBL3163897 0.83 POLB (0.36) MAPTL3MBTL1MRGPRX4POLBNPC1
Trifluoromethanesulfonic Acid SCHEMBL6564934 0.83 ACHE (0.34) TDP1RORC
Trifluoromethanesulfonic Acid SCHEMBL6566070 0.83 KMT2A (0.38)
Trifluoromethanesulfonic Acid SCHEMBL6564421 0.81 KDM4E (0.32) LMNAHPGD
Trifluoromethanesulfonic Acid SCHEMBL7796145 0.81 ACHE (0.38) PLAUNPC1
Trifluoromethanesulfonic Acid SCHEMBL7796611 0.81 ALOX5 (0.43) PLAUPLATMAPTTDP1MRGPRX4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed