Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 1/20 | 0.37 |
| ▸ | ELANE | P08246 | 1/20 | 0.35 |
| ▸ | MTNR1A | P48039 | 1/20 | 0.31 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.31 |
| ▸ | KDM1A | O60341 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Trifluoromethanesulfonic Acid SCHEMBL6562919 | 0.92 | CA2 (0.37) | CA2ELANEMTNR1AMTNR1BKDM1A | |
| Trifluoromethanesulfonic Acid SCHEMBL6564802 | 0.90 | MTNR1A (0.36) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564556 | 0.87 | CA2 (0.36) | CA2MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564628 | 0.87 | MMP2 (0.35) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564868 | 0.86 | MMP2 (0.37) | ELANEMTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564748 | 0.85 | KMT2A (0.37) | ELANEMTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564719 | 0.83 | MTNR1A (0.39) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564870 | 0.82 | MTNR1A (0.38) | MTNR1AMTNR1B | |
| Trifluoromethanesulfonic Acid SCHEMBL6564876 | 0.82 | GAA (0.32) | ELANE | |
| Trifluoromethanesulfonic Acid SCHEMBL6564834 | 0.81 | MTNR1A (0.32) | MTNR1AMTNR1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0849634-B1 | Radiation sensitive resin composition | JSR CORP (JP) | 2004-03-31 | — | — | EP | disclosed |
| US-6322949-B2 | SULFONIUM COMPOUND AS PHOTOACID GENERATOR | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-11-27 | — | — | US | disclosed |
| US-20010014427-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 2001-08-16 | — | — | US | disclosed |
| US-6187504-B1 | PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION | JSR CORPORATION (JP) | 2001-02-13 | — | — | US | disclosed |
| EP-0849634-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-06-24 | — | — | EP | disclosed |