SCHEMBL6566360

SCHEMBL6566360

Cc1ccc(S(=O)(=O)[O-])cc1.Oc1ccc2cccc([S+]3CCCC3)c2c1

nearest known ligand 0.40

Known targets — ChEMBL curated mechanism

CHRM1CHRM2CHRM3CHRM4CHRM5SLC6A2dacAdacBdacCftsImrcAmrcBmrdA

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HKDC1 Q2TB90 1/20 0.40
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
GAA P10253 2/20 0.37
POLB P06746 1/20 0.37
MCL1 Q07820 1/20 0.35
TRPV1 Q8NER1 1/20 0.35
MTNR1A P48039 1/20 0.34
MTNR1B P49286 1/20 0.34
LMNA P02545 1/20 0.34
PKM P14618 1/20 0.34
HTT P42858 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
ALDH1A1 P00352 1/20 0.34
CYTH2 Q99418 1/20 0.34
RRM1 P23921 1/20 0.34
PTGES O14684 1/20 0.33
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
KAT6A Q92794 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6564762 0.91 KMT2A (0.38) HKDC1MEN1KMT2AGAAPOLB
Trifluoromethanesulfonic Acid SCHEMBL6566258 0.82 TRPV1 (0.37) MEN1KMT2AMCL1TRPV1MTNR1A
SCHEMBL6564827 0.81 MEN1 (0.50) HKDC1MEN1KMT2AGAAPOLB
SCHEMBL6566223 0.76 EP300 (0.47) HKDC1MEN1KMT2AGAAPOLB
SCHEMBL2900947 0.74 ACHE (0.39) MEN1KMT2AGAAPOLBLMNA
Trifluoromethanesulfonic Acid SCHEMBL6563570 0.72 HSD17B1 (0.36) TRPV1ESR1ESR2HSD17B1HSD17B2
SCHEMBL4401013 0.69 GAA (0.41) MEN1KMT2AGAAPOLBLMNA
SCHEMBL808090 0.68 HKDC1 (0.61) HKDC1MEN1KMT2AGAAPOLB
SCHEMBL3881583 0.66 KMT2A (0.39) HKDC1MEN1KMT2AGAAPOLB
SCHEMBL11840096 0.66 GAA (0.45) MEN1KMT2AGAAPOLBLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed