SCHEMBL6566571

SCHEMBL6566571

OC1=C(c2ccccc2)CC1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CFTR P13569 1/20 0.42
GOPC Q9HD26 1/20 0.42
BCL2L1 Q07817 2/20 0.42
MMP3 P08254 1/20 0.42
ALDH1A1 P00352 2/20 0.40
BACE1 P56817 1/20 0.40
FGF23 Q9GZV9 1/20 0.39
HPGD P15428 2/20 0.39
HSD17B10 Q99714 1/20 0.39
KMT2A Q03164 1/20 0.37
CA12 O43570 1/20 0.36
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
GLA P06280 1/20 0.36
CA3 P07451 1/20 0.36
CA4 P22748 1/20 0.36
CA9 Q16790 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
CA14 Q9ULX7 1/20 0.36
ALOX5 P09917 2/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6810189 0.85 FGF23 (0.46) CFTRGOPCBCL2L1MMP3ALDH1A1
SCHEMBL5006722 0.85 FGF23 (0.50) CFTRGOPCBCL2L1MMP3ALDH1A1
SCHEMBL29681890 0.83 SLC6A2 (0.46) CFTRGOPCBCL2L1MMP3ALDH1A1
SCHEMBL7212942 0.80 ALDH1A1 (0.53) CFTRGOPCBCL2L1MMP3ALDH1A1
SCHEMBL8317973 0.73 PRCP (0.43) SLC6A2SLC6A4SLC6A3
SCHEMBL8900922 0.72 CFTR (0.46) CFTRGOPCBCL2L1MMP3ALDH1A1
SCHEMBL8653245 0.69 PTGS2 (0.54) CFTRGOPCALDH1A1FGF23HPGD
SCHEMBL8518215 0.69 PTGS2 (0.59) CFTRGOPCALDH1A1FGF23KMT2A
SCHEMBL10384372 0.69 SLC6A2 (0.50) CFTRGOPCALDH1A1KMT2ASLC6A2
SCHEMBL868869 0.67 CFTR (0.68) CFTRGOPCBCL2L1MMP3ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0849634-B1 Radiation sensitive resin composition JSR CORP (JP) 2004-03-31 EP disclosed
US-6322949-B2 SULFONIUM COMPOUND AS PHOTOACID GENERATOR JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-11-27 US disclosed
US-20010014427-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 2001-08-16 US disclosed
US-6187504-B1 PHOTOSENSITIVE BLEND CONTAINING A NAPHTHALENE SULFONIUM SULFONATE DERIVATIVE PHOTOACID GENERATOR, RESIN HAVING ALKALI INSOLUBLE GROUPS CLEAVABLE BY ACID, AN ALKALI SOLUBLE RESIN AND A SOLUBILITY CONTROL AGENT; POSITIVES, RESOLUTION JSR CORPORATION (JP) 2001-02-13 US disclosed
EP-0849634-A1 Radiation sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1998-06-24 EP disclosed