SCHEMBL6570958

SCHEMBL6570958

COC(O)C(=O)[O-].[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5976304 0.94 CA4 (0.33)
SCHEMBL1819079 0.75
SCHEMBL8504431 0.73
SCHEMBL1299349 0.71
SCHEMBL844108 0.71
SCHEMBL11422588 0.71 CA1 (0.35)
L-Lactic Acid SCHEMBL7999572 0.69 TP53 (0.50)
L-Lactic Acid SCHEMBL4360 0.69
L-Lactic Acid SCHEMBL1332699 0.69
L-Lactic Acid SCHEMBL186171 0.69

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118772087-A Preparation process of furanone 福建省沙县青州日化有限公司 2024-10-15 CN claimed
CN-118772087-A Preparation process of furanone 福建省沙县青州日化有限公司 2024-10-15 CN disclosed
EP-1112297-B1 METHOD FOR COATING A TEXTILE COGNIS CORP (US) 2004-04-28 EP disclosed
EP-1208146-B1 SCREEN COATING COMPOSITION AND METHOD FOR APPLYING SAME COGNIS CORP (US) 2004-04-21 EP disclosed
EP-1112307-B1 SCREEN COATING COMPOSITION AND METHOD FOR APPLYING SAME COGNIS CORP (US) 2004-01-21 EP disclosed
EP-1208151-A4 RADIATION-POLYMERIZABLE COMPOSITION, FLUSHING AND GRINDING VEHICLE CONTAINING SAME COGNIS CORP (US) 2003-01-22 EP disclosed
EP-1208146-A4 SCREEN COATING COMPOSITION AND METHOD FOR APPLYING SAME COGNIS CORP (US) 2003-01-08 EP disclosed
EP-1208146-A1 SCREEN COATING COMPOSITION AND METHOD FOR APPLYING SAME Cognis Corporation (US) 2002-05-29 EP disclosed
EP-1208151-A1 RADIATION-POLYMERIZABLE COMPOSITION, FLUSHING AND GRINDING VEHICLE CONTAINING SAME Cognis Corporation (US) 2002-05-29 EP disclosed
EP-0894097-A4 RADIATION CURABLE RHEOLOGY MODIFIERS HENKEL CORP (US) 2002-05-02 EP disclosed
WO-2001012711-A1 SCREEN COATING COMPOSITION AND METHOD FOR APPLYING SAME COGNIS CORPORATION (US) 2001-02-22 WO disclosed
US-6156816-A Screen coating composition and method for applying same HENKEL CORPORATION (US) 2000-12-05 US disclosed
WO-2000011068-A1 SCREEN COATING COMPOSITION AND METHOD FOR APPLYING SAME COGNIS CORPORATION (US) 2000-03-02 WO disclosed
WO-2000011061-A1 METHOD FOR COATING A TEXTILE COGNIS CORPORATION (US) 2000-03-02 WO disclosed
US-5889076-A Radiation curable rheology modifiers HENKEL CORPORATION (US) 1999-03-30 US disclosed
WO-1999010409-A1 RADIATION-POLYMERIZABLE COMPOSITION AND PRINTING INKS CONTAINING SAME HENKEL CORPORATION (US) 1999-03-04 WO disclosed
EP-0894097-A1 RADIATION CURABLE RHEOLOGY MODIFIERS HENKEL CORPORATION (US) 1999-02-03 EP disclosed
WO-1998044007-A1 RADIATION-POLYMERIZABLE COMPOSITION AND PRINTING INKS CONTAINING SAME HENKEL CORPORATION (US) 1998-10-08 WO disclosed
US-5804671-A Radiation curable rheology modifiers HENKEL CORPORATION (US) 1998-09-08 US disclosed
WO-1997038022-A1 RADIATION CURABLE RHEOLOGY MODIFIERS HENKEL CORPORATION (US) 1997-10-16 WO disclosed