SCHEMBL664301

SCHEMBL664301

COC(C)(c1ccccc1)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 15)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.52
ALDH1A1 P00352 3/20 0.48
ALOX15 P16050 1/20 0.48
CES1 P23141 1/20 0.43
KCNN4 O15554 4/20 0.43
TAAR1 Q96RJ0 1/20 0.42
ESR1 P03372 2/20 0.41
ESR2 Q92731 2/20 0.41
CYP3A4 P08684 1/20 0.41
MAPT P10636 1/20 0.39
KMT2A Q03164 1/20 0.39
TSHR P16473 2/20 0.39
CA4 P22748 1/20 0.39
CYP2C19 P33261 1/20 0.38
HIF1A Q16665 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9694917 0.89 TSHR (0.52) MAPK1ALDH1A1ALOX15CES1ESR1
SCHEMBL13772372 0.87 CHRM2 (0.49) MAPK1ALDH1A1ALOX15ESR1ESR2
SCHEMBL9694912 0.80 MAPK1 (0.40) MAPK1ALDH1A1ALOX15CES1KCNN4
SCHEMBL7129049 0.80 MAPK1 (0.55) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL9576890 0.80 MAPK1 (0.62) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL204375 0.78 MAPK1 (0.52) MAPK1ALDH1A1ALOX15CES1KCNN4
SCHEMBL42639 0.78 MAPK1 (0.67) MAPK1ALDH1A1ALOX15CES1KCNN4
SCHEMBL3844071 0.78 MAPK1 (0.52) MAPK1ALDH1A1ALOX15CES1KCNN4
SCHEMBL7800340 0.76 MAPK1 (0.50) MAPK1ALDH1A1ALOX15KCNN4TAAR1
SCHEMBL8426498 0.76 MAPK1 (0.50) MAPK1ALDH1A1ALOX15KCNN4TAAR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 88 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119874486-A Process for preparing hydrogenated benomyl and analogues thereof 浙江六康生物科技有限公司 2025-04-25 CN disclosed
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-06-27 US disclosed
US-11815813-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-11-14 US disclosed
US-20230314939-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-10-05 US disclosed
US-20230305395-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230305392-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-20230305392-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-09-28 US disclosed
US-11740555-B2 Resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-08-29 US disclosed
US-20100292159-A1 METHOD OF TREATMENT OR PROPHYLAXIS OF INFLAMMATORY PAIN UNIVERSITY OF QUEENSLAND (AU) 2010-11-18 US disclosed
EP-0261962-B1 PROCESS FOR PRODUCING PROPYLENE BLOCK COPOLYMER MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1993-07-28 EP disclosed
EP-0197311-B1 PROCESS FOR POLYMERIZING ETHYLENE MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1991-12-18 EP disclosed
EP-0177841-B1 PROCESS FOR PRODUCTION OF OLEFIN POLYMERS MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1989-03-22 EP disclosed
US-4762898-A Process for polymerizing ethylene MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1988-08-09 US disclosed
EP-0261962-A2 Process for producing propylene block copolymer MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1988-03-30 EP disclosed
US-4701505-A SOLID CATALYST MITSUBISHI PETROCHEMICAL COMPANY LIMITED (JP) 1987-10-20 US disclosed
EP-0197311-A2 Process for polymerizing ethylene MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1986-10-15 EP disclosed
EP-0177841-A1 Process for production of olefin polymers MITSUBISHI PETROCHEMICAL CO., LTD. (JP) 1986-04-16 EP disclosed
US-3957434-A POLYAMIDES, POLYESTERS CIBA-GEIGY CORPORATION (US) 1976-05-18 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20240210824-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SCO2, CBR1, OXGR1 MAPK1 4308/4885ALDH1A1 492/4885ALOX15 914/4885
US-20230305391-A1 SALT, ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN RER1, H1-0, BET1 MAPK1 244/4885ALDH1A1 1692/4885ALOX15 711/4885
US-20230314939-A1 CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN H1-10, H1-0, HCAR1 MAPK1 3193/4885ALDH1A1 124/4885ALOX15 1441/4885
US-11740555-B2 Resist composition and method for producing resist pattern RER1, GAR1, REV1 MAPK1 3121/4885ALDH1A1 356/4885ALOX15 404/4885
US-20100292159-A1 METHOD OF TREATMENT OR PROPHYLAXIS OF INFLAMMATORY PAIN AGTR2, AGTR1, BDKRB2 MAPK1 1644/4885ALDH1A1 2034/4885ALOX15 415/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.