SCHEMBL6673208

SCHEMBL6673208

Cc1ccc(NNC=O)cc1

nearest known ligand 0.45

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TDP1 Q9NUW8 4/20 0.45
HPGD P15428 4/20 0.45
MAPT P10636 2/20 0.45
KDM4E B2RXH2 2/20 0.45
ALDH1A1 P00352 2/20 0.45
CYP1A2 P05177 2/20 0.45
CYP3A4 P08684 2/20 0.45
CYP2D6 P10635 2/20 0.45
CYP2C9 P11712 2/20 0.45
ALOX12 P18054 2/20 0.45
CYP2C19 P33261 2/20 0.45
PKM P14618 1/20 0.45
APOBEC3G Q9HC16 1/20 0.45
MEN1 O00255 2/20 0.43
KMT2A Q03164 2/20 0.43
LMNA P02545 1/20 0.43
CYP2A6 P11509 1/20 0.42
PTGS2 P35354 2/20 0.41
TGM2 P21980 1/20 0.41
CA1 P00915 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10424387 0.88 MAPT (0.50) TDP1HPGDMAPTKDM4EALDH1A1
SCHEMBL11054842 0.87 ALDH1A1 (0.53) TDP1MAPTALDH1A1MEN1KMT2A
SCHEMBL27895985 0.82 RAB9A (0.71) TDP1HPGDMAPTKDM4EALDH1A1
SCHEMBL1758240 0.76 PTGS2 (0.45) TDP1MAPTALDH1A1CYP1A2CYP3A4
SCHEMBL21280058 0.76 TGM2 (0.45) TDP1HPGDMAPTKDM4EALDH1A1
SCHEMBL6727924 0.76 MAPT (0.43) TDP1HPGDMAPTKDM4EALDH1A1
SCHEMBL2383778 0.76 IDO1 (0.45) TDP1MAPTKDM4EALDH1A1MEN1
SCHEMBL6671214 0.76 TGM2 (0.41) TDP1HPGDMAPTKDM4EALDH1A1
SCHEMBL9644441 0.76 ALDH1A1 (0.31) ALDH1A1
SCHEMBL8989664 0.76 ALDH5A1 (0.42) TDP1HPGDMAPTKDM4EALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2120852-A None JP disclosed
JP-2120851-A None JP disclosed
CN-113896663-A Heat-sensitive acid generator and preparation method and application thereof 北京印刷学院 2022-01-07 CN disclosed
US-20070155634-A1 Grease composition for automobile wheel bearing NTN CORPORATION (JP) 2007-07-05 US disclosed
EP-1057076-B1 HIGH CONTRAST PHOTOGRAPHIC SILVER HALIDE MATERIAL EASTMAN KODAK CO (US) 2004-09-29 EP disclosed
US-6383711-B1 PHOTOGRAPHIC FILMS WITH SUPPORTS AND SILVER HALIDE EMULSIONS AND HYDROPHILIC COLLOIDS EASTMAN KODAK COMPANY 2002-05-07 US disclosed
EP-0682288-B1 High contrast photographic silver halide material EASTMAN KODAK CO (US) 2001-06-27 EP disclosed
EP-0672945-B1 Silver halide color photographic light-sensitive material KONISHIROKU PHOTO IND (JP) 2001-06-13 EP disclosed
EP-0681208-B1 High contrast photographic silver halide material EASTMAN KODAK CO (US) 2001-05-16 EP disclosed
EP-1057076-A1 HIGH CONTRAST PHOTOGRAPHIC SILVER HALIDE MATERIAL EASTMAN KODAK COMPANY (US) 2000-12-06 EP disclosed
EP-0226184-A2 Nucleation development control agent for photographic silver halide materials and processes EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-06-24 EP disclosed
US-4650746-A HYDRAZIDE NUCLEATING AGENTS EASTMAN KODAK COMPANY (US) 1987-03-17 US disclosed
EP-0204530-A2 Method for forming direct positive color image KONICA CORPORATION (JP) 1986-12-10 EP disclosed
EP-0190512-A2 Positive image forming method KONICA CORPORATION (JP) 1986-08-13 EP disclosed
EP-0079583-B1 RADIATION-SENSITIVE EMULSION AND DIRECT-POSITIVE PHOTOGRAPHIC ELEMENT CONTAINING THE SAME EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1986-06-11 EP disclosed
US-RE32097-E Blended grain direct-positive emulsions and photographic elements and processes for their use EASTMAN KODAK COMPANY (US) 1986-03-25 US disclosed
US-4444865-A Blended grain direct-positive emulsions and photographic elements and processes for their use EASTMAN KODAK COMPANY (US) 1984-04-24 US disclosed
EP-0032456-B1 METHOD FOR HIGH CONTRAST DEVELOPMENT OF PHOTOGRAPHIC ELEMENTS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1983-02-02 EP disclosed
EP-0032456-A1 Method for high contrast development of photographic elements EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1981-07-22 EP disclosed
US-4080207-A Radiation-sensitive compositions and photographic elements containing N-(acylhydrazinophenyl) thioamide nucleating agents EASTMAN KODAK COMPANY (US) 1978-03-21 US disclosed