Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KMT2A | Q03164 | 3/20 | 0.41 |
| ▸ | PTGS2 | P35354 | 2/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.41 |
| ▸ | MEN1 | O00255 | 2/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | AKR1C3 | P42330 | 1/20 | 0.37 |
| ▸ | AKR1C2 | P52895 | 1/20 | 0.37 |
| ▸ | AKR1C1 | Q04828 | 1/20 | 0.37 |
| ▸ | KDM1A | O60341 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.37 |
| ▸ | EGFR | P00533 | 1/20 | 0.36 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.36 |
| ▸ | KDR | P35968 | 1/20 | 0.36 |
| ▸ | SLC6A4 | P31645 | 4/20 | 0.35 |
| ▸ | SLC6A2 | P23975 | 3/20 | 0.35 |
| ▸ | SLC6A3 | Q01959 | 3/20 | 0.35 |
| ▸ | CYP1A1 | P04798 | 1/20 | 0.35 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12256916 | 0.84 | KMT2A (0.42) | KMT2APTGS2CYP1A2MEN1CYP3A4 | |
| Bromide SCHEMBL3136632 | 0.82 | KMT2A (0.41) | KMT2APTGS2CYP1A2MEN1CYP3A4 | |
| Trifluoromethanesulfonic Acid SCHEMBL74504 | 0.82 | ALDH1A1 (0.39) | KMT2APTGS2MEN1ALDH1A1LMNA | |
| SCHEMBL3282071 | 0.80 | KMT2A (0.40) | KMT2APTGS2CYP1A2MEN1CYP3A4 | |
| SCHEMBL106751 | 0.80 | TSHR (0.39) | ALDH1A1LMNA | |
| Bromide SCHEMBL4338303 | 0.77 | TSHR (0.37) | ALDH1A1LMNAMAPT | |
| Fluoride Ion SCHEMBL29753699 | 0.77 | TSHR (0.37) | ALDH1A1LMNA | |
| Hydrochloric Acid SCHEMBL157811 | 0.77 | TSHR (0.37) | ALDH1A1LMNAKDM4E | |
| Iodide SCHEMBL1043793 | 0.77 | TSHR (0.37) | ALDH1A1LMNA | |
| SCHEMBL8607841 | 0.77 | TSHR (0.37) | ALDH1A1LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114851551-B | Preparation method and application of 4D printed continuous fiber reinforced liquid crystal elastomer artificial muscle | 哈尔滨工业大学 | 2022-11-29 | — | — | CN | claimed |
| CN-114851551-A | Preparation method and application of 4D printed continuous fiber reinforced liquid crystal elastomer artificial muscle | 哈尔滨工业大学 | 2022-08-05 | — | — | CN | claimed |
| CN-114851551-B | Preparation method and application of 4D printed continuous fiber reinforced liquid crystal elastomer artificial muscle | 哈尔滨工业大学 | 2022-11-29 | — | — | CN | disclosed |
| CN-114851551-A | Preparation method and application of 4D printed continuous fiber reinforced liquid crystal elastomer artificial muscle | 哈尔滨工业大学 | 2022-08-05 | — | — | CN | disclosed |
| US-20220119591-A1 | PHOTO-PATTERNABLE ORGANIC SEMICONDUCTOR (OSC) POLYMERS AND METHODS OF FORMATION AND APPLICATIONS THEREOF | CORNING INCORPORATED | 2022-04-21 | — | — | US | disclosed |
| US-20210147352-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | SAN-APRO LTD. (JP) | 2021-05-20 | — | — | US | disclosed |
| US-10947346-B2 | Polyarylene sulfide resin, method for producing same, poly(arylene sulfonium salt), and method for producing poly(arylene sulfonium salt) | DIC CORPORATION (JP) | 2021-03-16 | — | — | US | disclosed |
| US-20200157284-A1 | POLYARYLENE SULFIDE RESIN, METHOD FOR PRODUCING SAME, POLY(ARYLENE SULFONIUM SALT), AND METHOD FOR PRODUCING POLY(ARYLENE SULFONIUM SALT) | DAINIPPON INK & CHEMICALS (JP) | 2020-05-21 | — | — | US | disclosed |
| US-10577464-B2 | Polyarylene sulfide resin, method for producing same, poly(arylene sulfonium salt), and method for producing poly(arylene sulfonium salt) | DIC CORPORATION (JP) | 2020-03-03 | — | — | US | disclosed |
| US-20180057635-A1 | POLYARYLENE SULFIDE RESIN, METHOD FOR PRODUCING SAME, POLY(ARYLENE SULFONIUM SALT), AND METHOD FOR PRODUCING POLY(ARYLENE SULFONIUM SALT) | DIC CORPORATION (JP) | 2018-03-01 | — | — | US | disclosed |
| US-20170218125-A1 | POLYARYLENE SULFIDE RESIN, MANUFACTURING METHOD THEREFOR, AND MOLDING | DAINIPPON INK & CHEMICALS (JP) | 2017-08-03 | — | — | US | disclosed |
| US-20120203030-A1 | PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-08-09 | — | — | US | disclosed |
| US-20120203024-A1 | PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-08-09 | — | — | US | disclosed |
| US-8158327-B2 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2012-04-17 | — | — | US | disclosed |
| WO-2012024005-A2 | COATING SYSTEMS CAPABLE OF FORMING AMBIENTLY CURED HIGHLY DURABLE HYDROPHOBIC COATINGS ON SUBSTRATES | LUNA INNOVATIONS INCORPORATED (US) | 2012-02-23 | — | — | WO | disclosed |
| US-8026390-B2 | Photoacid generator containing aromatic ring | Korea Kumho Petrochenicals Co., Ltd. (KR) | 2011-09-27 | — | — | US | disclosed |
| US-20100113818-A1 | Photoacid generator containing aromatic ring | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2010-05-06 | — | — | US | disclosed |
| US-20100075256-A1 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2010-03-25 | — | — | US | disclosed |
| US-20090291390-A1 | Acid generating agent for chemically amplified resist compositions | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-11-26 | — | — | US | disclosed |
| US-20090234155-A1 | Acid generating agent for chemically amplified resist compositions | KOREA KUMHO PETROCHEMICAL CO., LTD. (KR) | 2009-09-17 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120203024-A1 | PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME | ARF1, ARFGAP1, ARFIP2 | KMT2A 2829/4885PTGS2 851/4885CYP1A2 1310/4885 |
| US-20090291390-A1 | Acid generating agent for chemically amplified resist compositions | ABCC1, CBR1, ARSA | KMT2A 423/4885PTGS2 4110/4885CYP1A2 852/4885 |
| US-20120203030-A1 | PHOTOACID GENERATOR, METHOD FOR PRODUCING THE SAME, AND RESIST COMPOSITION COMPRISING THE SAME | ARF1, ARFGAP1, RALA | KMT2A 2487/4885PTGS2 915/4885CYP1A2 1472/4885 |
| US-20100113818-A1 | Photoacid generator containing aromatic ring | HAO2, PAH, PPOX | KMT2A 3730/4885PTGS2 2123/4885CYP1A2 44/4885 |
| US-20090234155-A1 | Acid generating agent for chemically amplified resist compositions | POLM, CBR1, PFAS | KMT2A 1547/4885PTGS2 3477/4885CYP1A2 1117/4885 |
| US-20210147352-A1 | SULFONIUM SALT, PHOTOACID GENERATOR, CURABLE COMPOSITION, AND RESIST COMPOSITION | H1-0, SPIN1, IK | KMT2A 3196/4885PTGS2 2989/4885CYP1A2 2160/4885 |
| US-20100075256-A1 | Onium salt compound, polymer compound comprising the salt compound, chemically amplified resist composition comprising the polymer compound, and method for patterning using the composition | ARF5, ARL1, FGFR2 | KMT2A 566/4885PTGS2 4144/4885CYP1A2 4097/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.