Trifluoromethanesulfonic Acid

Trifluoromethanesulfonic Acid

SCHEMBL74504

CSc1ccc([S+](C)c2ccccc2)cc1.O=S(=O)([O-])C(F)(F)F

nearest known ligand 0.39

Full drug profile on Sugi Atlas →

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 9/20 0.39
LMNA P02545 1/20 0.38
GPR3 P46089 2/20 0.38
KMT2A Q03164 3/20 0.36
TSHR P16473 3/20 0.35
SMN1; SMN2 Q16637 1/20 0.35
POLB P06746 2/20 0.35
PTGS2 P35354 2/20 0.34
MAPK1 P28482 1/20 0.34
GAA P10253 1/20 0.34
ESR1 P03372 1/20 0.34
HPGD P15428 1/20 0.33
TAS2R14 Q9NYV8 1/20 0.33
MEN1 O00255 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Trifluoromethanesulfonic Acid SCHEMBL3139918 0.89 ALDH1A1 (0.40) ALDH1A1LMNAGPR3KMT2ATSHR
Trifluoromethanesulfonic Acid SCHEMBL36165 0.87 GPR3 (0.47) GPR3
Trifluoromethanesulfonic Acid SCHEMBL2949122 0.84 GPR3 (0.36) ALDH1A1GPR3PTGS2GAA
Trifluoromethanesulfonic Acid SCHEMBL6323261 0.84 ALDH1A1 (0.37) ALDH1A1LMNAGPR3KMT2ATSHR
SCHEMBL670781 0.82 KMT2A (0.41) ALDH1A1LMNAKMT2ASMN1; SMN2PTGS2
Trifluoromethanesulfonic Acid SCHEMBL31028107 0.81 KCNH2 (0.43) ALDH1A1LMNAGPR3ESR1
Trifluoromethanesulfonic Acid SCHEMBL36457 0.77 GPR3 (0.47) GPR3
SCHEMBL3144298 0.76 ALDH1A1 (0.35) ALDH1A1LMNAKMT2ATSHRSMN1; SMN2
SCHEMBL3132742 0.75 ALDH1A1 (0.35) ALDH1A1LMNAKMT2ATSHRSMN1; SMN2
SCHEMBL3126430 0.75 ALDH1A1 (0.35) ALDH1A1LMNAKMT2ATSHRSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 28 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8129491-B2 Siloxane resin coating DOW CORNING CORPORATION (US) 2012-03-06 US claimed
EP-1846479-A2 SILOXANE RESIN COATING Dow Corning Corporation (US) 2007-10-24 EP claimed
WO-2006065310-A2 SILOXANE RESIN COATING DOW CORNING CORPORATION (US) 2006-06-22 WO claimed
US-12456394-B2 Tamper-evident device with optically transparent layer and related method Optrical Limited (GB) 2025-10-28 US disclosed
US-12265328-B2 Photoactive, inorganic ligand-capped inorganic nanocrystals THE UNIVERSITY OF CHICAGO (US) 2025-04-01 US disclosed
US-12187065-B2 Security devices Optrical Limited (GB) 2025-01-07 US disclosed
US-20230341770-A1 PHOTOACTIVE, INORGANIC LIGAND-CAPPED INORGANIC NANOCRYSTALS THE UNIVERSITY OF CHICAGO 2023-10-26 US disclosed
EP-3613070-B1 PHOTOPATTERNABLE FILM UNIV CHICAGO (US) 2023-10-18 EP disclosed
EP-3794575-B1 IMPROVEMENTS IN AND RELATING TO TAMPER-EVIDENT DEVICES OPTRICAL LTD (GB) 2023-08-09 EP disclosed
US-11720017-B2 Photoactive, inorganic ligand-capped inorganic nanocrystals THE UNIVERSITY OF CHICAGO (US) 2023-08-08 US disclosed
US-20220339958-A1 IMPROVEMENTS IN AND RELATING TO SECURITY DEVICES Optrical Limited (GB) 2022-10-27 US disclosed
EP-1846479-B1 SILOXANE RESIN COATING DOW CORNING (US) 2010-10-27 EP disclosed
US-20070261600-A1 Siloxane Resin Coating DOW CORNING CORPORATION 2007-11-15 US disclosed
EP-1846479-A2 SILOXANE RESIN COATING Dow Corning Corporation (US) 2007-10-24 EP disclosed
US-7147801-B2 Ink jet ink composition and method for security marking VIDEOJET TECHNOLOGIES INC. (US) 2006-12-12 US disclosed
WO-2006065310-A2 SILOXANE RESIN COATING DOW CORNING CORPORATION (US) 2006-06-22 WO disclosed
EP-1601729-B1 INK JET INK COMPOSITION AND METHOD FOR SECURITY MAKING VIDEOJET TECHNOLOGIES INC (US) 2006-06-21 EP disclosed
EP-0972761-B1 Sulfonium salt and its manufacturing method KOREA KUMHO PETROCHEM CO LTD (KR) 2001-12-12 EP disclosed
US-6111143-A BY ONE-STEP REACTION BETWEEN SULFOXIDE COMPOUND AND AROMATIC COMPOUND IN PRESENCE OF PERFLUOROALKANESULFONIC ANHYDRIDE; USE AS POLYMERIZATION PHOTOINITIATOR, OR PHOTOACID GENERATOR LEAVING THE PROTECTION GROUPS OF ORGANIC COMPOUNDS KOREA KUMBO PETROCHEMICAL CO., LTD. (KR) 2000-08-29 US disclosed
EP-0972761-A1 Sulfonium salt and its manufacturing method Korea Kumho Petrochemical Co. Ltd. (KR) 2000-01-19 EP disclosed