Predicted protein targets (top 5)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EPHX2 | P34913 | 2/20 | 0.31 |
| ▸ | SLC6A3 | Q01959 | 2/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
| ▸ | BRS3 | P32247 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL25802902 | 0.88 | SLC6A3 (0.31) | EPHX2SLC6A3ALDH1A1HSD17B10BRS3 | |
| SCHEMBL1819178 | 0.88 | SLC6A3 (0.31) | EPHX2SLC6A3ALDH1A1HSD17B10BRS3 | |
| SCHEMBL15836512 | 0.82 | EPHX2 (0.30) | EPHX2SLC6A3BRS3 | |
| SCHEMBL16807396 | 0.82 | EPHX2 (0.34) | EPHX2ALDH1A1 | |
| SCHEMBL15840370 | 0.82 | SLC6A3 (0.34) | EPHX2SLC6A3 | |
| SCHEMBL15470560 | 0.82 | LMNA (0.41) | — | |
| SCHEMBL16807395 | 0.81 | EPHX2 (0.35) | EPHX2ALDH1A1 | |
| SCHEMBL24564784 | 0.80 | — | — | |
| SCHEMBL14272255 | 0.79 | CYP17A1 (0.30) | — | |
| SCHEMBL5004824 | 0.78 | ATM (0.36) | EPHX2SLC6A3BRS3 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9170488-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2015-10-27 | — | — | US | disclosed |
| US-20140295350-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORP (JP) | 2014-10-02 | — | — | US | disclosed |
| US-8795954-B2 | Resist pattern-forming method, and radiation-sensitive resin composition | JSR CORPORATION (JP) | 2014-08-05 | — | — | US | disclosed |
| US-20130224666-A1 | RESIST PATTERN-FORMING METHOD, AND RADIATION-SENSITIVE RESIN COMPOSITION | JSR CORPORATION (JP) | 2013-08-29 | — | — | US | disclosed |
| US-20110275774-A1 | ORGANOANTIMONY COMPOUND, PROCESS FOR PREPARING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER WITH USE OF SAME, AND THE POLYMER | YAMAGO SHIGERU | 2011-11-10 | — | — | US | disclosed |
| US-8008414-B2 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2011-08-30 | — | — | US | disclosed |
| EP-1829883-B1 | ORGANIC BISMUTH COMPOUND, METHOD FOR PRODUCING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING POLYMER USING SAME, AND POLYMER | OTSUKA CHEMICAL CO LTD (JP) | 2011-08-17 | — | — | EP | disclosed |
| EP-1767539-B1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL CO LTD (JP) | 2011-07-27 | — | — | EP | disclosed |
| US-7847043-B2 | Organic bismuth compound, method for producing same, living radical polymerization initiator, method for producing polymer using same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2010-12-07 | — | — | US | disclosed |
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20070265404-A1 | Organic Bismuth Compound, Method for Producing Same, Living Radical Polymerization Initiator, Method for Producing Polymer Using Same, and Polymer | OTSUKA CHEMICAL CO., LTD. (JP) | 2007-11-15 | — | — | US | disclosed |
| EP-1829883-A1 | ORGANIC BISMUTH COMPOUND, METHOD FOR PRODUCING SAME, LIVING RADICAL POLYMERIZATION INITIATOR, METHOD FOR PRODUCING POLYMER USING SAME, AND POLYMER | Otsuka Chemical Co., Ltd. (JP) | 2007-09-05 | — | — | EP | disclosed |
| EP-1767539-A1 | ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER | OTSUKA CHEMICAL COMPANY, LTD. (JP) | 2007-03-28 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070265404-A1 | Organic Bismuth Compound, Method for Producing Same, Living Radical Polymerization Initiator, Method for Producing Polymer Using Same, and Polymer | DOHH, COASY, ODC1 | EPHX2 455/4885SLC6A3 4586/4885ALDH1A1 874/4885 |
| US-20090299008-A1 | Organic antimony compound, process for producing the same, living radical polymerization initiator, process for producing polymer using the same, and polymer | AOC2, ODC1, MCM7 | EPHX2 1883/4885SLC6A3 4428/4885ALDH1A1 1542/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.