Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 10/20 | 0.62 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.62 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.46 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.41 |
| ▸ | NPC1 | O15118 | 3/20 | 0.41 |
| ▸ | GAA | P10253 | 3/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.41 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.41 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.41 |
| ▸ | CASP1 | P29466 | 1/20 | 0.41 |
| ▸ | CASP7 | P55210 | 1/20 | 0.41 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.41 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.41 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.41 |
| ▸ | IDO1 | P14902 | 3/20 | 0.39 |
| ▸ | TDP1 | Q9NUW8 | 4/20 | 0.39 |
| ▸ | ADRA2B | P18089 | 1/20 | 0.39 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.39 |
| ▸ | RECQL | P46063 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ether SCHEMBL11226528 | 0.98 | ALDH1A1 (0.59) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL17626940 | 0.94 | ALDH1A1 (0.54) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL22471900 | 0.90 | ALDH1A1 (0.50) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL28632893 | 0.87 | ALDH1A1 (0.56) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL11160122 | 0.87 | ALDH1A1 (0.68) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL1278893 | 0.84 | ALDH1A1 (0.52) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL6411662 | 0.82 | ALDH1A1 (0.49) | ALDH1A1L3MBTL1KDM4EGAASMN1; SMN2 | |
| Ether SCHEMBL6229706 | 0.82 | CD44 (0.43) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL11876095 | 0.82 | PTPRC (0.39) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 | |
| Ether SCHEMBL491471 | 0.82 | PTPRC (0.39) | ALDH1A1L3MBTL1HSD17B10KDM4ENPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-8003315-A | — | — | None | — | — | JP | disclosed |
| EP-3018118-B1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2023-07-05 | — | — | EP | disclosed |
| EP-3327002-B1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2020-08-19 | — | — | EP | disclosed |
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-10-01 | — | — | US | disclosed |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| EP-3327002-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2018-05-30 | — | — | EP | disclosed |
| EP-3098226-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| EP-3018118-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | Wako Pure Chemical Industries, Ltd. (JP) | 2016-05-11 | — | — | EP | disclosed |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | TOKYO UNIVERSITY OF SCIENCE FOUNDATION (JP) | 2016-05-05 | — | — | US | disclosed |
| US-20040062878-A1 | Aligning agent for liquid crystal for in-plane switching, liquid-crystal alignment film, and liquid-crystal display element | MANO YUICHI (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1331510-A1 | ALIGNING AGENT FOR LIQUID CRYSTAL FOR IN-PLANE SWITCHING, LIQUID-CRYSTAL ALIGNMENT FILM, AND LIQUID-CRYSTAL DISPLAY ELEMENT | Nissan Chemical Industries, Ltd. (JP) | 2003-07-30 | — | — | EP | disclosed |
| JP-H083315-A | PRODUCTION OF SOLUBLE POLYSOIMIDE | JAPAN SYNTHETIC RUBBER CO LTD | 1996-01-09 | — | — | JP | disclosed |
| EP-0350958-A2 | Improved polyimide and polyimide film and manufacturing method thereof | KANEGAFUCHI KAGAKU KOGYO KABUSHIKI KAISHA (JP) | 1990-01-17 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-10428015-B2 | Acid-resistant base and/or radical generator, and curable resin composition containing said base and/or radical generator | REV1, RER1, CBR1 | ALDH1A1 847/4885L3MBTL1 1943/4885HSD17B10 2032/4885 |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | BLM, HPRT1, BROX | ALDH1A1 2646/4885L3MBTL1 4030/4885HSD17B10 3980/4885 |
| US-10428014-B2 | Base generator, base-reactive composition containing said base generator, and base generation method | HPRT1, GNG2, BLM | ALDH1A1 1468/4885L3MBTL1 4682/4885HSD17B10 2538/4885 |
| US-20190002403-A1 | ACID-RESISTANT BASE AND/OR RADICAL GENERATOR, AND CURABLE RESIN COMPOSITION CONTAINING SAID BASE AND/OR RADICAL GENERATOR | REV1, RER1, CBR1 | ALDH1A1 847/4885L3MBTL1 1943/4885HSD17B10 2032/4885 |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | ENPP3, GNG2, ENPP1 | ALDH1A1 4040/4885L3MBTL1 3400/4885HSD17B10 4563/4885 |
| US-20160122292-A1 | BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD | GNG2, EPHX2, ARHGEF1 | ALDH1A1 483/4885L3MBTL1 3859/4885HSD17B10 1269/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.