SCHEMBL683156

SCHEMBL683156

COC(C)OCCOc1ccccc1Oc1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NPSR1 Q6W5P4 1/20 0.44
L3MBTL1 Q9Y468 5/20 0.42
ALDH1A1 P00352 2/20 0.42
MAPK1 P28482 1/20 0.42
HTT P42858 1/20 0.42
KDM4E B2RXH2 1/20 0.39
MAPT P10636 3/20 0.38
LMNA P02545 3/20 0.38
TP53 P04637 1/20 0.38
RIPK1 Q13546 1/20 0.38
SLC6A2 P23975 1/20 0.38
SLC6A4 P31645 1/20 0.38
TTR P02766 1/20 0.38
CYP1A2 P05177 2/20 0.38
CYP2C19 P33261 2/20 0.38
POLB P06746 1/20 0.38
MEN1 O00255 1/20 0.38
CYP3A4 P08684 1/20 0.38
CYP2C9 P11712 1/20 0.38
RECQL P46063 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14443372 0.85 KDM4E (0.50) NPSR1L3MBTL1ALDH1A1MAPK1HTT
SCHEMBL683431 0.84 LTA4H (0.56) MAPTLTA4HPPARGPPARDPPARA
SCHEMBL775134 0.83 KCNA3 (0.50) ALDH1A1MAPTLMNARECQLLTA4H
SCHEMBL682087 0.81 HTR1A (0.54) L3MBTL1ALDH1A1MAPK1KDM4EMAPT
SCHEMBL683138 0.79 CYP1A2 (0.45) NPSR1L3MBTL1ALDH1A1MAPTLMNA
SCHEMBL682086 0.78 MEN1 (0.47) L3MBTL1ALDH1A1MAPTLMNATP53
SCHEMBL682848 0.77 SLC7A5 (0.44) NPSR1L3MBTL1ALDH1A1CYP1A2CYP2C19
SCHEMBL8482839 0.76 ALDH1A1 (0.62) NPSR1ALDH1A1HTTKDM4ELMNA
SCHEMBL31628276 0.74 L3MBTL1 (0.63) NPSR1L3MBTL1ALDH1A1MAPK1HTT
SCHEMBL28300288 0.74 LTA4H (0.55) NPSR1L3MBTL1ALDH1A1MAPK1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed