SCHEMBL683260

SCHEMBL683260

CCCCCc1ccccc1OCCOC(C)Oc1ccc(C(C)CC)cc1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SLC7A5 Q01650 1/20 0.39
PPARD Q03181 1/20 0.38
CSNK1A1 P48729 1/20 0.36
CSNK1D P48730 1/20 0.36
PRKCD Q05655 1/20 0.36
PAK1 Q13153 1/20 0.36
CAMK2B Q13554 1/20 0.36
CAMK2G Q13555 1/20 0.36
CAMK2D Q13557 1/20 0.36
TAOK1 Q7L7X3 1/20 0.36
MAPT P10636 2/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
HPGD P15428 1/20 0.36
ATM Q13315 1/20 0.36
KCNH2 Q12809 1/20 0.36
LTB4R Q15722 1/20 0.36
LTB4R2 Q9NPC1 1/20 0.36
THRA P10827 1/20 0.36
THRB P10828 1/20 0.36
CYP1A2 P05177 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL683286 0.90 SLC7A5 (0.43) SLC7A5MAPTL3MBTL1CYP1A2CYP2C9
SCHEMBL682951 0.82 ALDH1A1 (0.48) SLC7A5MEN1KMT2ATDP1ALDH1A1
SCHEMBL682946 0.81 ALDH1A1 (0.48) MEN1KMT2ATDP1ALDH1A1TSHR
SCHEMBL12974513 0.81 SLC7A5 (0.42) SLC7A5MAPTMEN1KMT2ATDP1
SCHEMBL14252111 0.81 ALDH1A1 (0.47) MEN1KMT2ATDP1ALDH1A1TSHR
SCHEMBL682068 0.80 ALOX5 (0.44) PPARDCSNK1A1CSNK1DPRKCDPAK1
SCHEMBL682848 0.79 SLC7A5 (0.44) SLC7A5L3MBTL1ATMKCNH2LTB4R
SCHEMBL682190 0.79 TSHR (0.44) SLC7A5MEN1KMT2ATDP1ALDH1A1
SCHEMBL683584 0.79 PPARA (0.45) KCNH2PPARA
SCHEMBL12054775 0.79 SLC7A5 (0.46) SLC7A5MAPTMEN1KMT2ATDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-9090722-B2 Chemical amplification resist composition, and mold preparation method and resist film using the same FUJIFILM CORPORATION (JP) 2015-07-28 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
US-20120006788-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2012-01-12 US disclosed
WO-2010150917-A1 CHEMICAL AMPLIFICATION RESIST COMPOSITION, AND MOLD PREPARATION METHOD AND RESIST FILM USING THE SAME FUJIFILM CORPORATION (JP) 2010-12-29 WO disclosed
US-7250246-B2 Positive resist composition and pattern formation method using the same FUJIFILM CORPORATION (JP) 2007-07-31 US disclosed