Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PARP10 | Q53GL7 | 6/20 | 0.50 |
| ▸ | POLB | P06746 | 2/20 | 0.49 |
| ▸ | SRD5A2 | P31213 | 3/20 | 0.49 |
| ▸ | MMP2 | P08253 | 1/20 | 0.48 |
| ▸ | MMP14 | P50281 | 1/20 | 0.48 |
| ▸ | PARP15 | Q460N3 | 3/20 | 0.47 |
| ▸ | PARP14 | Q460N5 | 2/20 | 0.47 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.47 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.47 |
| ▸ | PARP16 | Q8N5Y8 | 1/20 | 0.47 |
| ▸ | PARP11 | Q9NR21 | 1/20 | 0.47 |
| ▸ | PARP4 | Q9UKK3 | 1/20 | 0.47 |
| ▸ | STS | P08842 | 2/20 | 0.46 |
| ▸ | NR4A1 | P22736 | 1/20 | 0.45 |
| ▸ | TNKS | O95271 | 1/20 | 0.45 |
| ▸ | TNKS2 | Q9H2K2 | 1/20 | 0.45 |
| ▸ | PARP2 | Q9UGN5 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 3/20 | 0.43 |
| ▸ | HPGD | P15428 | 2/20 | 0.43 |
| ▸ | ESR1 | P03372 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7654088 | 0.88 | PARP10 (0.58) | PARP10POLBSRD5A2MMP2MMP14 | |
| SCHEMBL19809245 | 0.87 | NR4A1 (0.58) | PARP10POLBMMP2MMP14KMT2A | |
| SCHEMBL716944 | 0.87 | NR4A1 (0.58) | PARP10POLBMMP2MMP14KMT2A | |
| SCHEMBL6849115 | 0.86 | ALDH1A1 (0.50) | PARP10POLBSRD5A2PARP15PARP14 | |
| SCHEMBL30040301 | 0.84 | NR4A1 (0.61) | PARP10POLBMMP2MMP14KMT2A | |
| SCHEMBL436522 | 0.84 | NR4A1 (0.61) | PARP10POLBMMP2MMP14KMT2A | |
| SCHEMBL17267870 | 0.84 | STS (0.47) | PARP10POLBSRD5A2MMP2MMP14 | |
| SCHEMBL563890 | 0.83 | MEN1 (0.61) | PARP10POLBMMP2MMP14KMT2A | |
| Hydrochloric Acid SCHEMBL10770715 | 0.82 | NR4A1 (0.58) | POLBMMP2MMP14KMT2AALDH1A1 | |
| SCHEMBL1348470 | 0.81 | CYP3A4 (0.58) | PARP10POLBMMP2MMP14KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-11542397-B2 | Liquid composition, quantum dot-containing film, optical film, light-emitting display element panel, and light-emitting display device | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-01-03 | — | — | US | disclosed |
| US-20210309866-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LIGHT-EMITTING DISPLAY ELEMENT PANEL, AND LIGHT-EMITTING DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-10-07 | — | — | US | disclosed |
| EP-3812805-A1 | LIQUID COMPOSITION, QUANTUM DOT-CONTAINING FILM, OPTICAL FILM, LUMINESCENT DISPLAY ELEMENT PANEL, AND LUMINESCENT DISPLAY DEVICE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-04-28 | — | — | EP | disclosed |
| US-10696845-B2 | Energy-sensitive resin composition | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-06-30 | — | — | US | disclosed |
| US-10570269-B2 | Composition containing microparticles | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-02-25 | — | — | US | disclosed |
| EP-3275940-B1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO LTD (JP) | 2019-12-18 | — | — | EP | disclosed |
| US-20190225804-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-07-25 | — | — | US | disclosed |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-17 | — | — | US | disclosed |
| US-20180194930-A1 | COMPOSITION CONTAINING MICROPARTICLES | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-07-12 | — | — | US | disclosed |
| US-9981914-B2 | — | — | 2018-05-29 | — | — | US | disclosed |
| EP-3275940-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | Tokyo Ohka Kogyo Co., Ltd. (JP) | 2018-01-31 | — | — | EP | disclosed |
| EP-2947112-B1 | METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN | TOKYO OHKA KOGYO CO LTD (JP) | 2017-09-13 | — | — | EP | disclosed |
| US-20170115563-A1 | ENERGY-SENSITIVE RESIN COMPOSITION | TOKYO OHKA KOGYO CO., LTD. (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9410055-B2 | Polybenzoxazole resin and precursor thereof | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2016-08-09 | — | — | US | disclosed |
| US-20150337084-A1 | METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-26 | — | — | US | disclosed |
| EP-2947112-A1 | METHOD FOR PRODUCING POLYBENZOXAZOLE RESIN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-11-25 | — | — | EP | disclosed |
| EP-2695906-A1 | POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF | Mitsubishi Gas Chemical Company, Inc. (JP) | 2014-02-12 | — | — | EP | disclosed |
| US-20130324662-A1 | POLYBENZOXAZOLE RESIN AND PRECURSOR THEREOF | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-12-05 | — | — | US | disclosed |
| US-6780561-B2 | FOR FORMING PROTECTIVE FILM OR AN INSULATING FILM FOR A SEMICONDUCTOR ELEMENT OR A CIRCUIT BOARD SUCH AS A PRINTED BOARD | KANSAI PAINT CO., LTD. (JP) | 2004-08-24 | — | — | US | disclosed |
| US-20030143480-A1 | For forming protective film or an insulating film for a semiconductor element or a circuit board such as a printed board | KANSAI PAINT CO., LTD. (JP) | 2003-07-31 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20180194930-A1 | COMPOSITION CONTAINING MICROPARTICLES | CHMP4B, EXOSC10, EXOSC9 | PARP10 3701/4885POLB 806/4885SRD5A2 4333/4885 |
| US-10023540-B2 | Hydrogen barrier agent, hydrogen barrier film forming composition, hydrogen barrier film, method for producing hydrogen barrier film, and electronic element | SLC9A2, SLC9A1, NHERF1 | PARP10 4462/4885POLB 2120/4885SRD5A2 2464/4885 |
| US-10570269-B2 | Composition containing microparticles | CHMP4B, EXOSC10, EXOSC9 | PARP10 3701/4885POLB 806/4885SRD5A2 4333/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.