SCHEMBL68909

SCHEMBL68909

C[Si](C)(Cl)c1ccccc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 1/20 0.44
ESR2 Q92731 1/20 0.44
NR1H2 P55055 2/20 0.35
NR1H3 Q13133 2/20 0.35
TSHR P16473 5/20 0.35
LMNA P02545 1/20 0.35
ALOX12 P18054 1/20 0.35
ACHE P22303 1/20 0.35
MAPT P10636 1/20 0.34
ALDH1A1 P00352 3/20 0.33
TDP1 Q9NUW8 2/20 0.33
CTSD P07339 1/20 0.33
HSD17B10 Q99714 1/20 0.33
NPC1 O15118 2/20 0.32
RAB9A P51151 2/20 0.32
SMN1; SMN2 Q16637 1/20 0.32
CES2 O00748 1/20 0.31
CES1 P23141 1/20 0.31
MAOA P21397 1/20 0.31
MAOB P27338 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL6673779 0.97 ESR1 (0.42) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL6519029 0.92 ESR1 (0.39) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL10318044 0.84 CYP1A2 (0.46) ESR1ESR2MAPTALDH1A1TDP1
SCHEMBL705667 0.83 ALDH1A1 (0.36) ESR1ESR2ALDH1A1
SCHEMBL197544 0.81 ESR1 (0.44) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL144807 0.81 ESR1 (0.44) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL9383203 0.81 ESR1 (0.44) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL23898214 0.79 ESR1 (0.42) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL8040586 0.79 ESR1 (0.48) ESR1ESR2NR1H2NR1H3TSHR
SCHEMBL5549278 0.79 ACHE (0.32) ESR1ESR2ACHE

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3601 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20260136853-A1 REMOVING OR PREVENTING RESIDUE SUBSEQUENT TO REPAIRING LOW-K MATERIALS APPLIED MATERIALS, INC. (US) 2026-05-14 US claimed
US-20250351335-A1 METHOD AND STRUCTURE OF LOW-K SPACER USING POST-TREATMENT FOR MEMORY APPLICATIONS APPLIED MATERIALS, INC. (US) 2025-11-13 US claimed
CN-119869608-A Preparation method of modified Ti-MSU molecular sieve catalyst, modified Ti-MSU molecular sieve catalyst and application 中国石油化工股份有限公司 2025-04-25 CN claimed
US-20250122084-A1 Electrochemically Active-Material Structures Comprising Silicon and Inert Elements and Methods of Fabricating Thereof CLYRA INC. 2025-04-17 US claimed
WO-2025081149-A1 ELECTROCHEMICALLY ACTIVE-MATERIAL STRUCTURES COMPRISING SILICON AND INERT ELEMENTS AND METHODS OF FABRICATING THEREOF GRU Energy Lab Inc. (US) 2025-04-17 WO claimed
US-20250112054-A1 CARBON REPLENISHMENT OF SILICON-CONTAINING MATERIALS TO REDUCE THICKNESS LOSS APPLIED MATERIALS, INC. (US) 2025-04-03 US claimed
CN-119708496-A Preparation method of methyl phenyl vinyl MQ silicon resin 浙江恒业成新材料有限公司 2025-03-28 CN claimed
WO-2025061290-A1 PRODUCTION OF MONO-SUBSTITUTED HALOSILOXANES FROM CYCLOTRISILOXANES WACKER CHEMIE AG (DE) 2025-03-27 WO claimed
CN-115448944-B Synthesis method of methyl phenyl dimethoxy silane 湖北兴瑞硅材料有限公司 2024-11-26 CN claimed
CN-116474718-B Hydrophobic lithium-type oxygen-making molecular sieve adsorbent, and preparation method and application thereof 中触媒新材料股份有限公司 2024-10-22 CN claimed
US-5594156-A REACTING AN ALDEHYDE OR KETONE WITH HYDROGEN CYANIDE, A TRISUBSTITUTED HALOSILANE AND A CORRESPONDINGLY SUBSTITUTED DISILAZANE OR SILYL AMINE HULS AMERICA INC. (US) 1997-01-14 US claimed
US-5565540-A COHYDROLYZING TRIORGANOHALOSILANE AND DIORGANODIHALOSILANE IN PRESENCE OF BASIC COMPOUND IN TWO-LAYER LIQUID SYSTEM DOW CORNING TORAY SILICON CO., LTD. (JP) 1996-10-15 US claimed
US-5563229-A Method of producing organopolysiloxane with low polymerization degree SHIN-ETSU CHEMICAL CO., LTD. (JP) 1996-10-08 US claimed
WO-1996012723-A1 PROCESS FOR PREPARING ALKYLSILYL OR ARYLSILYL ETHERS FMC CORPORATION (US) 1996-05-02 WO claimed
US-5493044-A Process for preparing alkylsilyl or arylsilyl ethers FMC CORPORATION (US) 1996-02-20 US claimed
EP-0368169-B1 Method for producing organic crystal SUMITOMO ELECTRIC INDUSTRIES (JP) 1995-07-19 EP claimed
US-5363797-A Method for producing organic crystal and crystal growth cell therefor SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1994-11-15 US claimed
US-5099035-A Lactonization, reacting the triol with a silyl chloride protecting group E. R. SQUIBB & SONS, INC. (US) 1992-03-24 US claimed
EP-0368169-A1 Method for producing organic crystal SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1990-05-16 EP claimed
US-4267298-A Process for preparing M-stopped silicone fluids from silanol fluids GENERAL ELECTRIC COMPANY (US) 1981-05-12 US claimed