Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CES2 | O00748 | 1/20 | 0.47 |
| ▸ | CES1 | P23141 | 1/20 | 0.47 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | GSK3B | P49841 | 2/20 | 0.41 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.38 |
| ▸ | HDAC3 | O15379 | 5/20 | 0.37 |
| ▸ | HDAC1 | Q13547 | 5/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 5/20 | 0.37 |
| ▸ | OGG1 | O15527 | 1/20 | 0.37 |
| ▸ | POLB | P06746 | 1/20 | 0.36 |
| ▸ | CTDSP1 | Q9GZU7 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 2/20 | 0.36 |
| ▸ | CA2 | P00918 | 2/20 | 0.36 |
| ▸ | NHERF1 | O14745 | 1/20 | 0.36 |
| ▸ | HDAC10 | Q969S8 | 2/20 | 0.36 |
| ▸ | HDAC11 | Q96DB2 | 2/20 | 0.36 |
| ▸ | HDAC8 | Q9BY41 | 2/20 | 0.36 |
| ▸ | HDAC6 | Q9UBN7 | 2/20 | 0.36 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6931693 | 0.83 | CES2 (0.47) | CES2CES1HSD11B1LMNAMAPT | |
| SCHEMBL6927935 | 0.83 | CES2 (0.50) | CES2CES1HTTGSK3BKMT2A | |
| SCHEMBL9010901 | 0.76 | KMT2A (0.51) | CES2CES1HTTKMT2APOLB | |
| SCHEMBL9010850 | 0.75 | CA2 (0.49) | CES2CES1KMT2AHSD11B1CA1 | |
| SCHEMBL22230717 | 0.69 | MAPT (0.48) | CES2CES1HTTGSK3BKMT2A | |
| SCHEMBL29015897 | 0.68 | CES2 (0.52) | CES2CES1HTTGSK3BKMT2A | |
| SCHEMBL557285 | 0.67 | CES2 (1.00) | CES2CES1HTTGSK3BKMT2A | |
| SCHEMBL384658 | 0.66 | CES2 (0.46) | CES2CES1KMT2ALMNAMAPT | |
| SCHEMBL9010795 | 0.66 | CES2 (0.48) | CES2CES1HTTKMT2AHSD11B1 | |
| SCHEMBL17338792 | 0.65 | KMT2A (0.50) | CES2CES1HTTGSK3BKMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6589705-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-6555289-B2 | Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-29 | — | — | US | disclosed |
| US-6528229-B2 | Mixture of polymer and acid generators | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6506535-B1 | A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020048720-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20010041303-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1096319-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |
| EP-0417556-B1 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AG (DE) | 1996-12-11 | — | — | EP | disclosed |
| EP-0444493-B1 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AG (DE) | 1996-11-20 | — | — | EP | disclosed |
| US-5424166-A | Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1995-06-13 | — | — | US | disclosed |
| US-5340682-A | Sensitive, heat resistant, noncorrosive | HOECHST AKTIENGESELLSCHAFT (DE) | 1994-08-23 | — | — | US | disclosed |
| EP-0444493-A2 | Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-09-04 | — | — | EP | disclosed |
| EP-0417556-A2 | Positive-working radiation-sensitive mixture and recording material prepared therefrom | HOECHST AKTIENGESELLSCHAFT (DE) | 1991-03-20 | — | — | EP | disclosed |