SCHEMBL9010901

SCHEMBL9010901

Cc1ccc(S(=O)(=O)C(=[N+]=[N-])C(=O)c2ccc(Br)cc2)cc1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 5/20 0.51
CES2 O00748 4/20 0.42
CES1 P23141 4/20 0.42
L3MBTL1 Q9Y468 1/20 0.42
EGFR P00533 1/20 0.41
ERBB2 P04626 1/20 0.41
POLB P06746 3/20 0.40
KDM4E B2RXH2 1/20 0.40
APEX1 P27695 1/20 0.40
RECQL P46063 1/20 0.40
TDP1 Q9NUW8 1/20 0.40
MEN1 O00255 2/20 0.40
CYP2C9 P11712 2/20 0.40
ALDH1A1 P00352 2/20 0.40
HTT P42858 2/20 0.40
LMNA P02545 1/20 0.40
NOD2 Q9HC29 1/20 0.40
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
CA4 P22748 2/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9010795 0.93 CES2 (0.48) KMT2ACES2CES1POLBRECQL
SCHEMBL6932211 0.86 CES2 (0.56) KMT2ACES2CES1L3MBTL1EGFR
SCHEMBL9010850 0.85 CA2 (0.49) KMT2ACES2CES1EGFRERBB2
SCHEMBL384364 0.85 CES2 (0.51) KMT2ACES2CES1L3MBTL1RECQL
SCHEMBL384366 0.85 CES2 (0.51) KMT2ACES2CES1L3MBTL1RECQL
SCHEMBL9010806 0.84 KMT2A (0.43) KMT2AEGFRERBB2POLBRECQL
SCHEMBL9010786 0.83 ALDH1A1 (0.52) KMT2ACES2CES1EGFRPOLB
SCHEMBL9010805 0.82 CYP11B1 (0.43) KMT2ACES2CES1POLBALDH1A1
SCHEMBL7697548 0.81 MMP2 (0.39) KMT2ACES2CES1POLBTDP1
SCHEMBL7722385 0.81 LMNA (0.51) KMT2ACES2CES1POLBCYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0417556-B1 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AG (DE) 1996-12-11 EP disclosed
EP-0444493-B1 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AG (DE) 1996-11-20 EP disclosed
US-5424166-A Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom HOECHST AKTIENGESELLSCHAFT (DE) 1995-06-13 US disclosed
US-5340682-A Sensitive, heat resistant, noncorrosive HOECHST AKTIENGESELLSCHAFT (DE) 1994-08-23 US disclosed
EP-0444493-A2 Negative working radiation sensitive composition and radiation sensitive recording material produced therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-09-04 EP disclosed
EP-0417556-A2 Positive-working radiation-sensitive mixture and recording material prepared therefrom HOECHST AKTIENGESELLSCHAFT (DE) 1991-03-20 EP disclosed