Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 2/20 | 0.47 |
| ▸ | PKM | P14618 | 2/20 | 0.43 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.43 |
| ▸ | TAS2R14 | Q9NYV8 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.39 |
| ▸ | CXCR4 | P61073 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.38 |
| ▸ | EGFR | P00533 | 1/20 | 0.38 |
| ▸ | ERBB2 | P04626 | 1/20 | 0.38 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | HTR2A | P28223 | 1/20 | 0.37 |
| ▸ | HTR2C | P28335 | 1/20 | 0.37 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6932111 | 0.84 | KMT2A (0.48) | L3MBTL1TAS2R14ALDH1A1KMT2AEGFR | |
| SCHEMBL6932650 | 0.83 | LMNA (0.48) | HSD11B1L3MBTL1ALDH1A1PTGS2KMT2A | |
| SCHEMBL6931446 | 0.83 | HSD11B1 (0.47) | HSD11B1L3MBTL1ALDH1A1PTGS2KMT2A | |
| SCHEMBL6931275 | 0.80 | HSD11B1 (0.51) | HSD11B1L3MBTL1TAS2R14ALDH1A1PTGS2 | |
| SCHEMBL3169821 | 0.79 | PKM (0.46) | HSD11B1PKML3MBTL1ALDH1A1PTGS2 | |
| SCHEMBL6932115 | 0.78 | TSHR (0.36) | HSD11B1PTGS2KMT2AKDM4E | |
| SCHEMBL6933539 | 0.73 | KAT6A (0.49) | ALDH1A1KMT2A | |
| SCHEMBL28592865 | 0.71 | HSD11B1 (0.49) | HSD11B1PKML3MBTL1TAS2R14ALDH1A1 | |
| SCHEMBL28591292 | 0.71 | HSD11B1 (0.49) | HSD11B1PKML3MBTL1TAS2R14ALDH1A1 | |
| SCHEMBL2532563 | 0.71 | CA1 (0.45) | HSD11B1PKMALDH1A1PTGS2KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6589705-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-6555289-B2 | Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-29 | — | — | US | disclosed |
| US-6528229-B2 | Mixture of polymer and acid generators | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6506535-B1 | A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020048720-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20010041303-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1096319-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |