Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 3/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.48 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.47 |
| ▸ | MAPT | P10636 | 1/20 | 0.45 |
| ▸ | CES2 | O00748 | 1/20 | 0.43 |
| ▸ | CES1 | P23141 | 1/20 | 0.43 |
| ▸ | USP2 | O75604 | 1/20 | 0.41 |
| ▸ | RECQL | P46063 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 6/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.40 |
| ▸ | NOD2 | Q9HC29 | 1/20 | 0.40 |
| ▸ | CA12 | O43570 | 1/20 | 0.40 |
| ▸ | CA9 | Q16790 | 1/20 | 0.40 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.40 |
| ▸ | NPC1 | O15118 | 2/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.40 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6932111 | 0.84 | KMT2A (0.48) | LMNAHTTL3MBTL1MAPTALDH1A1 | |
| SCHEMBL7187006 | 0.84 | KMT2A (0.51) | LMNAHTTL3MBTL1MAPTCES2 | |
| SCHEMBL6931446 | 0.83 | HSD11B1 (0.47) | LMNAHTTL3MBTL1HSD11B1MAPT | |
| SCHEMBL6931744 | 0.83 | HSD11B1 (0.47) | L3MBTL1HSD11B1ALDH1A1PTGS2KMT2A | |
| SCHEMBL6931275 | 0.83 | HSD11B1 (0.51) | HTTL3MBTL1HSD11B1MAPTCES2 | |
| SCHEMBL6933539 | 0.83 | KAT6A (0.49) | LMNAHTTMAPTALDH1A1SMN1; SMN2 | |
| SCHEMBL384366 | 0.80 | CES2 (0.51) | LMNAHTTL3MBTL1HSD11B1MAPT | |
| SCHEMBL21838871 | 0.79 | MAPT (0.47) | LMNAHTTL3MBTL1HSD11B1MAPT | |
| SCHEMBL14600187 | 0.79 | MAPT (0.47) | LMNAHTTL3MBTL1HSD11B1MAPT | |
| SCHEMBL6926552 | 0.77 | MAPT (0.38) | HTTL3MBTL1MAPTALDH1A1SMN1; SMN2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6589705-B1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2003-07-08 | — | — | US | disclosed |
| US-6555289-B2 | Positive photoresist composition comprises a resin having a specific silicon-containing group on the side chain, the solubility of which resin in an akali developer increases under action of an acid | FUJI PHOTO FILM CO., LTD. (JP) | 2003-04-29 | — | — | US | disclosed |
| US-6528229-B2 | Mixture of polymer and acid generators | FUJI PHOTO FILM CO., LTD. (JP) | 2003-03-04 | — | — | US | disclosed |
| US-6506535-B1 | A positive working photoresist composition for use in the production of semiconductor integrated circuit devices, mask for the production of integrated circuits, printed wiring boards, liquid crystal panels | FUJI PHOTO FILM CO., LTD. (JP) | 2003-01-14 | — | — | US | disclosed |
| US-20020048720-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2002-04-25 | — | — | US | disclosed |
| US-20010041303-A1 | Positive photoresist composition | FUJIFILM CORPORATION (JP) | 2001-11-15 | — | — | US | disclosed |
| EP-1096319-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2001-05-02 | — | — | EP | disclosed |