Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA2 | P00918 | 3/20 | 0.48 |
| ▸ | CRBN | Q96SW2 | 1/20 | 0.41 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 2/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.39 |
| ▸ | TAS2R38 | P59533 | 1/20 | 0.38 |
| ▸ | EPHX1 | P07099 | 2/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.35 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.35 |
| ▸ | MMP12 | P39900 | 1/20 | 0.35 |
| ▸ | CA3 | P07451 | 2/20 | 0.34 |
| ▸ | CA5A | P35218 | 2/20 | 0.34 |
| ▸ | CA5B | Q9Y2D0 | 2/20 | 0.34 |
| ▸ | CA12 | O43570 | 1/20 | 0.34 |
| ▸ | CA4 | P22748 | 1/20 | 0.34 |
| ▸ | CA6 | P23280 | 1/20 | 0.34 |
| ▸ | CA7 | P43166 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL18158145 | 0.87 | CA2 (0.42) | CA2CRBNL3MBTL1ALDH1A1POLB | |
| SCHEMBL8589178 | 0.82 | CA2 (0.48) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL2053132 | 0.81 | CA2 (0.59) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL5598719 | 0.79 | TAS2R38 (0.67) | CA2CRBNL3MBTL1ALDH1A1POLB | |
| SCHEMBL20749882 | 0.78 | CA2 (0.43) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL18160927 | 0.75 | CA2 (0.53) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL2833779 | 0.75 | CA2 (0.53) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL14477917 | 0.74 | CA2 (0.46) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL8241782 | 0.74 | CA2 (0.46) | CA2L3MBTL1ALDH1A1POLBSMN1; SMN2 | |
| SCHEMBL17577421 | 0.74 | ALDH1A1 (0.37) | CA2CRBNALDH1A1TAS2R38EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| US-20240027902-A1 | CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| WO-2024005524-A1 | NOVEL ANION RECEPTOR COMPOUND AND ELECTROLYTE CONTAINING SAME | 자인에너지 주식회사 | 2024-01-04 | — | — | WO | disclosed |
| WO-2023162431-A1 | SECONDARY BATTERY ELECTROLYTE AND SECONDARY BATTERY | 株式会社村田製作所 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162429-A1 | SECONDARY BATTERY ELECTROLYTE AND SECONDARY BATTERY | 株式会社村田製作所 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162852-A1 | SECONDARY BATTERY ELECTROLYTE AND SECONDARY BATTERY | 株式会社村田製作所 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162432-A1 | SECONDARY BATTERY | 株式会社村田製作所 | 2023-08-31 | — | — | WO | disclosed |
| WO-2023162430-A1 | SECONDARY BATTERY ELECTROLYTE AND SECONDARY BATTERY | 株式会社村田製作所 | 2023-08-31 | — | — | WO | disclosed |
| US-20230272524-A1 | DEVICES HAVING A RARE EARTH (OXY) FLUORIDE COATING FOR IMPROVED RESISTANCE TO CORROSIVE CHEMICAL ENVIRONMENTS AND METHODS FOR MAKING AND USING THESE DEVICES | AIR LIQUIDE (FR) | 2023-08-31 | — | — | US | disclosed |
| WO-2023119949-A1 | SECONDARY BATTERY | 株式会社村田製作所 | 2023-06-29 | — | — | WO | disclosed |
| US-9523912-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, manufacturing method of electronic device, electronic device and compound | FUJIFILM CORPORATION (JP) | 2016-12-20 | — | — | US | disclosed |
| US-20160070167-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2016-03-10 | — | — | US | disclosed |
| US-20160070167-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | FUJIFILM CORPORATION (JP) | 2016-03-10 | — | — | US | disclosed |
| US-20130017377-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE SAME | FUJIFILM CORPORATION (JP) | 2013-01-17 | — | — | US | disclosed |
| US-20090246481-A1 | DISPERSION OF WATER-INSOLUBLE COLORANT, METHOD OF PRODUCING SUBSTANCE CONTAINING WATER-INSOLUBLE COLORANT, FINE PARTICLES OF WATER-INSOLUBLE COLORANT, DISPERSING AGENT FOR WATER-INSOLUBLE COLORANT, AND RECORDING LIQUID, INK SET, PRINTED ARTICLE, METHOD OF FORMING IMAGE AND IMAGE FORMING APPARATUS USING THE SAME | FUJIFILM CORPORATION (JP) | 2009-10-01 | — | — | US | disclosed |
| CN-1328261-C | Uracil compounds and their use | SUMITOMO CHEMICAL CO (JP) | 2007-07-25 | — | — | CN | disclosed |
| CN-1636981-A | Uracil compounds and their use | SUMITOMO CHEMICAL CO (JP) | 2005-07-13 | — | — | CN | disclosed |
| CN-1204137-C | Uracil compound and application thereof | SUMITOMO CHEMICAL CO (JP) | 2005-06-01 | — | — | CN | disclosed |
| EP-1329160-A2 | 4-ACYLAMINOPYRAZOLE DERIVATIVES | Sankyo Company, Limited (JP) | 2003-07-23 | — | — | EP | disclosed |
| CN-1316426-A | Uracil compound and application thereof | SUMITOMO CHEMICAL CO (JP) | 2001-10-10 | — | — | CN | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20160070167-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, ELECTRONIC DEVICE AND COMPOUND | RER1, TERB1, RXRA | CA2 4791/4885CRBN 3556/4885L3MBTL1 4417/4885 |
| US-20230272524-A1 | DEVICES HAVING A RARE EARTH (OXY) FLUORIDE COATING FOR IMPROVED RESISTANCE TO CORROSIVE CHEMICAL ENVIRONMENTS AND METHODS FOR MAKING AND USING THESE DEVICES | SOD1, CELF2, SOD3 | CA2 105/4885CRBN 2977/4885L3MBTL1 1457/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.