Known targets — ChEMBL curated mechanism
ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO
The experimentally established mechanism targets of Pyrophosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FDPS known ✓ | P14324 | 1/20 | 0.83 |
| ▸ | BLM | P54132 | 1/20 | 0.83 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.83 |
| ▸ | CA4 | P22748 | 1/20 | 0.35 |
| ▸ | INPPL1 | O15357 | 2/20 | 0.33 |
| ▸ | INPP5A | Q14642 | 2/20 | 0.33 |
| ▸ | BTN3A1 | O00481 | 2/20 | 0.33 |
| ▸ | SMPD1 | P17405 | 1/20 | 0.33 |
| ▸ | INPP5B | P32019 | 1/20 | 0.33 |
| ▸ | CA2 | P00918 | 1/20 | 0.33 |
| ▸ | ITPR3 | Q14573 | 3/20 | 0.32 |
| ▸ | ITPR2 | Q14571 | 1/20 | 0.32 |
| ▸ | ITPR1 | Q14643 | 1/20 | 0.32 |
| ▸ | SLC34A1 | Q06495 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyrophosphoric Acid SCHEMBL5873309 | 1.00 | FDPS (0.83) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL622703 | 1.00 | FDPS (0.83) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL8923555 | 1.00 | FDPS (0.83) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL8528787 | 1.00 | FDPS (0.83) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL16684942 | 0.96 | FDPS (0.77) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL1001202 | 0.96 | FDPS (0.91) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL10585386 | 0.96 | FDPS (0.91) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL2403605 | 0.96 | FDPS (0.91) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL9751415 | 0.96 | FDPS (0.91) | FDPSBLMTDP1CA4INPPL1 | |
| Pyrophosphoric Acid SCHEMBL2348555 | 0.96 | FDPS (0.91) | FDPSBLMTDP1CA4INPPL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 76 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025047919-A1 | NEGATIVE THERMAL EXPANSION MATERIAL, METHOD FOR PRODUCING SAME, AND COMPOSITE MATERIAL | 日本化学工業株式会社 | 2025-03-06 | — | — | WO | disclosed |
| CN-118974330-A | Surface-treated copper foil, copper foil roll, copper foil laminate, and printed wiring board | 古河电气工业株式会社 | 2024-11-15 | — | — | CN | disclosed |
| WO-2023190860-A1 | SURFACE TREATED COPPER FOIL, COPPER FOIL ROLL, COPPER CLAD LAMINATE, AND PRINTED WIRING BOARD | 古河電気工業株式会社 | 2023-10-05 | — | — | WO | disclosed |
| CN-116445132-A | Infrared absorbing substance, method for producing the same and ink | 中钞印制技术研究院有限公司 | 2023-07-18 | — | — | CN | disclosed |
| EP-3438050-B1 | NEAR-INFRARED ABSORBING WHITE MATERIAL AND PREPARATION METHOD THEREOF | BUSEONG POLYCOM CO LTD (KR) | 2023-04-05 | — | — | EP | disclosed |
| US-10926354-B2 | Near-infrared absorbing white material and preparation method thereof | BUSEONG POLYCOM CO., LTD. (KR) | 2021-02-23 | — | — | US | disclosed |
| US-20190118294-A1 | NEAR-INFRARED ABSORBING WHITE MATERIAL AND PREPARATION METHOD THEREOF | BUSEONG POLYCOM CO., LTD. (KR) | 2019-04-25 | — | — | US | disclosed |
| EP-3438050-A2 | NEAR-INFRARED ABSORBING WHITE MATERIAL AND PREPARATION METHOD THEREOF | Buseong Polycom Co., Ltd (KR) | 2019-02-06 | — | — | EP | disclosed |
| US-9947925-B2 | Negative electrode for lithium-ion secondary battery | SANTOKU CORPORATION (JP) | 2018-04-17 | — | — | US | disclosed |
| US-20170317348-A1 | NEGATIVE ELECTRODE ACTIVE MATERIAL FOR NONAQUEOUS ELECTROLYTE SECONDARY BATTERIES | MITSUI MINING & SMELTING CO., LTD. (JP) | 2017-11-02 | — | — | US | disclosed |
| WO-2003012174-A1 | ELECTROLYTIC PROCESS FOR DEPOSITING A LAYER OF COPPER ON A STEEL WIRE | PIRELLI PNEUMATICI S.P.A. (IT) | 2003-02-13 | — | — | WO | disclosed |
| EP-0855620-B1 | Positive photoresist composition | JSR CORP (JP) | 2002-09-11 | — | — | EP | disclosed |
| EP-1207219-A1 | Equipment and method for covering a metallic element with a layer of copper | PIRELLI PNEUMATICI S.p.A. (IT) | 2002-05-22 | — | — | EP | disclosed |
| US-6334802-B1 | Electrode for a display device and method for manufacturing the same | FUJITSU LTD. (JP) | 2002-01-01 | — | — | US | disclosed |
| US-6191530-B1 | Electrode for a display device and method for manufacturing the same | FUJITSU LIMITED (JP) | 2001-02-20 | — | — | US | disclosed |
| US-5942369-A | ALKALI-SOLUBLE NOVOLAK RESIN; ALKALI SOLUBLE ACRYLIC RESIN OF RADICAL-POLYMERIZABLE UNITS CONTAINING A: HYDROXYL GROUP, CARBOXYL GROUP, OR PHENOLIC HYDROXYL GROUP; QUINONEDIAZIDE AND SOLVENT; THICK FILMS AS BUMP FORMING MATERIALS | JSR CORPORATION (JP) | 1999-08-24 | — | — | US | disclosed |
| EP-0855620-A1 | Positive photoresist composition | JSR Corporation (JP) | 1998-07-29 | — | — | EP | disclosed |
| EP-0427616-A1 | Nickel plating solution, nickelchromium electroplating method and nickel-chromium plating film | KANTO KASEI CO., LTD. (JP) | 1991-05-15 | — | — | EP | disclosed |
| EP-0269208-A1 | A process for the treatment of copper foil | ELECTROFOILS TECHNOLOGY LIMITED (GB) | 1988-06-01 | — | — | EP | disclosed |
| US-4460767-A | COPPER COMPOUND, CHLORIDE OR BROMIDE | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1984-07-17 | — | — | US | disclosed |