Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.57 |
| ▸ | LMNA | P02545 | 3/20 | 0.57 |
| ▸ | HPGD | P15428 | 3/20 | 0.57 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.57 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.57 |
| ▸ | CDK2 | P24941 | 3/20 | 0.57 |
| ▸ | CA1 | P00915 | 3/20 | 0.57 |
| ▸ | CA2 | P00918 | 3/20 | 0.57 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.57 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.57 |
| ▸ | EGFR | P00533 | 1/20 | 0.57 |
| ▸ | FYN | P06241 | 1/20 | 0.57 |
| ▸ | MMP2 | P08253 | 1/20 | 0.57 |
| ▸ | MMP9 | P14780 | 1/20 | 0.57 |
| ▸ | MMP8 | P22894 | 1/20 | 0.57 |
| ▸ | CA6 | P23280 | 1/20 | 0.57 |
| ▸ | MMP12 | P39900 | 1/20 | 0.57 |
| ▸ | RECQL | P46063 | 1/20 | 0.57 |
| ▸ | ADAMTS5 | Q9UNA0 | 1/20 | 0.57 |
| ▸ | DBH | P09172 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyrogallol SCHEMBL16714223 | 1.00 | ALDH1A1 (0.57) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Trifluoromethanesulfonic Acid SCHEMBL1712877 | 0.85 | CA2 (0.53) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL17768460 | 0.85 | ALDH1A1 (0.71) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL5388307 | 0.82 | CA2 (0.43) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL28700518 | 0.82 | CA2 (0.43) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL28963965 | 0.82 | ALDH1A1 (0.67) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL214769 | 0.80 | ALDH1A1 (0.63) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL209233 | 0.80 | ALDH1A1 (0.63) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL28234833 | 0.79 | CA2 (0.71) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Trifluoromethanesulfonic Acid SCHEMBL576036 | 0.77 | LMNA (0.52) | ALDH1A1LMNAHPGDALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 67 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024101411-A1 | CURABLE COMPOSITION FOR ORGANIC EL ELEMENTS, CURED PRODUCT FOR ORGANIC EL ELEMENTS AND METHOD FOR PRODUCING SAME, ORGANIC EL ELEMENT, AND POLYMER | JSR株式会社 | 2024-05-16 | — | — | WO | disclosed |
| US-11370888-B2 | Silicon-rich silsesquioxane resins | DOW SILICONES CORPORATION (US) | 2022-06-28 | — | — | US | disclosed |
| US-10990012-B2 | Silsesquioxane resin and oxaamine composition | DOW SILICONES CORPORATION (US) | 2021-04-27 | — | — | US | disclosed |
| US-20190211155-A1 | SILICON-RICH SILSESQUIOXANE RESINS | DOW SILICONES CORPORATION | 2019-07-11 | — | — | US | disclosed |
| US-20190169436-A1 | SILSESQUIOXANE RESIN AND SILYL-ANHYDRIDE COMPOSITION | DOW SILICONES CORP (US) | 2019-06-06 | — | — | US | disclosed |
| US-20190171106-A1 | Silsesquioxane Resin and Oxaamine Composition | DOW SILICONES CORPORATION | 2019-06-06 | — | — | US | disclosed |
| WO-2017218286-A1 | SILICON-RICH SILSESQUIOXANE RESINS | DOW CORNING CORPORATION (US) | 2017-12-21 | — | — | WO | disclosed |
| WO-2017192345-A1 | SILSESQUIOXANE RESIN AND OXAAMINE COMPOSITION | DOW CORNING CORPORATION (US) | 2017-11-09 | — | — | WO | disclosed |
| WO-2017192349-A1 | SILSESQUIOXANE RESIN AND SILYL-ANHYDRIDE COMPOSITION | DOW CORNING CORPORATION (US) | 2017-11-09 | — | — | WO | disclosed |
| US-9366959-B2 | Negative photosensitive resin composition and application thereof | CHI MEI CORPORATION (TW) | 2016-06-14 | — | — | US | disclosed |
| US-6506537-B2 | Photopolymerization | JSR CORPORATION (JP) | 2003-01-14 | — | — | US | disclosed |
| EP-1231205-A1 | VINYLPHENYLPROPIONIC ACID DERIVATIVES, PROCESSES FOR PRODUCTION OF THE DERIVATIVES, POLYMERS THEREOF AND RADIOSENSITIVE RESIN COMPOSITIONS | JSR Corporation (JP) | 2002-08-14 | — | — | EP | disclosed |
| US-20020012872-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-31 | — | — | US | disclosed |
| EP-1164433-A1 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0793144-B1 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-01-17 | — | — | EP | disclosed |
| US-5962180-A | COMPRISING (A) A COPOLYMER COMPRISING RECURRING UNITS OF A P-HYDROXYSTYRENE UNIT AND A STYRENE UNIT HAVING AN ACETAL GROUP OR A KETAL GROUP AT THE P-POSITION, (B) A COPOLYMER COMPRISING RECURRING UNITS OF A T-BUTYL (METH)ACRYLATE UNIT | JSR CORPORATION (JP) | 1999-10-05 | — | — | US | disclosed |
| EP-0793144-A2 | Radiation sensitive composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1997-09-03 | — | — | EP | disclosed |
| US-5482816-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-01-09 | — | — | US | disclosed |