Pyrogallol

Pyrogallol

SCHEMBL214769

CS(=O)(=O)O.Oc1cccc(O)c1O

nearest known ligand 0.63

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol

The experimentally established mechanism targets of Pyrogallol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
EGFR known ✓ P00533 1/20 0.63
MAOB known ✓ P27338 1/20 0.39
ALDH1A1 P00352 3/20 0.63
LMNA P02545 3/20 0.63
HPGD P15428 3/20 0.63
ALOX15 P16050 3/20 0.63
HSD17B10 Q99714 3/20 0.63
CA1 P00915 2/20 0.63
CA2 P00918 2/20 0.63
CDK2 P24941 2/20 0.63
TDP1 Q9NUW8 2/20 0.63
ADAMTS4 O75173 1/20 0.63
FYN P06241 1/20 0.63
MMP2 P08253 1/20 0.63
MMP9 P14780 1/20 0.63
MMP8 P22894 1/20 0.63
CA6 P23280 1/20 0.63
MMP12 P39900 1/20 0.63
RECQL P46063 1/20 0.63
ADAMTS5 Q9UNA0 1/20 0.63

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Pyrogallol SCHEMBL209233 1.00 ALDH1A1 (0.63) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL4255147 0.91 CA1 (0.52) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL17768460 0.89 ALDH1A1 (0.71) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL28963965 0.86 ALDH1A1 (0.67) ALDH1A1LMNAHPGDALOX15HSD17B10
SCHEMBL27897384 0.86 TRPA1 (0.74) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL1056082 0.85 ALDH1A1 (0.57) ALDH1A1LMNAHPGDALOX15HSD17B10
Catechol SCHEMBL11778548 0.83 SMN1; SMN2 (0.59) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL28234833 0.83 CA2 (0.71) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL16714223 0.80 ALDH1A1 (0.57) ALDH1A1LMNAHPGDALOX15HSD17B10
Pyrogallol SCHEMBL704091 0.80 ALDH1A1 (0.57) ALDH1A1LMNAHPGDALOX15HSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 217 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20240206322-A1 OPTICAL SEMICONDUCTOR DEVICE, METHOD FOR MANUFACTURING SAME, SOLID-STATE IMAGING DEVICE, AND ELECTRONIC DEVICE KANEKA CORPORATION (JP) 2024-06-20 US disclosed
US-11970557-B2 Polymer containing photoacid generator LG CHEM, LTD. (KR) 2024-04-30 US disclosed
US-20230408923-A1 SUBSTRATE LAMINATE, IMAGE SENSOR, AND METHOD FOR MANUFACTURING SUBSTRATE LAMINATE KANEKA CORPORATION (JP) 2023-12-21 US disclosed
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
CN-107561863-B Positive photosensitive resin composition and application thereof 奇美实业股份有限公司 2022-09-16 CN disclosed
US-11372330-B2 Anti-reflective coating forming composition containing reaction product of isocyanuric acid compound with benzoic acid compound NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2022-06-28 US disclosed
CN-111699206-B Polymers comprising photoacid generators 株式会社LG化学 2022-05-10 CN disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed
CN-107207456-B Latent acids and their use 巴斯夫欧洲公司 2021-05-04 CN disclosed
EP-2679645-B1 COATING MATERIAL CONTAINING ORGANIC/INORGANIC COMPOSITE, ORGANIC/INORGANIC COMPOSITE FILM AND ANTIREFLECTION MEMBER ASAHI CHEMICAL IND (JP) 2021-04-14 EP disclosed
EP-0898201-A1 Radiation sensitive resin composition JSR Corporation (JP) 1999-02-24 EP disclosed
US-5874195-A Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1999-02-23 US disclosed
US-5856058-A HALATION INHIBITOR WHICH IS AN ESTERIFICATION PRODUCT BETWEEN A SPECIFIED PHENOLIC COMPOUND AND A NAPHTHOQUINONE-1,2-DIAZIDE SULFONIC ACID. TOKYO OHKA KOGYO CO., LTD. (JP) 1999-01-05 US disclosed
US-5770343-A Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1998-06-23 US disclosed
EP-0793144-A2 Radiation sensitive composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1997-09-03 EP disclosed
EP-0660187-B1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO LTD (JP) 1997-03-05 EP disclosed
EP-0749044-A2 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed
EP-0749046-A1 Positive-working photoresist composition TOKYO OHKA KOGYO CO., LTD. (JP) 1996-12-18 EP disclosed
US-5556734-A RESISTS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1996-09-17 US disclosed
EP-0660187-A1 Radiation-sensitive resin composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-06-28 EP disclosed