Known targets — ChEMBL curated mechanism
ABL1ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB2AGTR1BCL2BCL2A1BCL2L1BCL2L10BCL2L2BCRBRAFCHRM1CHRNA10CHRNA9DRD1DRD2DRD3DRD4DRD5EGFRF2FLT1FLT4GCKGHSRGNRHRGRIN1GRIN2AGRIN2BGRIN2CGRIN2DGRIN3AGRIN3BHTR1AHTR1BHTR1DHTR2AHTR2CHTR3AIDH2KDRKITMAOBMCL1MTTPPP4HBPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PIKFYVEROCK1ROCK2SLC18A2SLC6A2SLC6A3SLC6A4TACR1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8gyrAgyrBparCparEpol
The experimentally established mechanism targets of Pyrogallol. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | EGFR known ✓ | P00533 | 1/20 | 0.63 |
| ▸ | MAOB known ✓ | P27338 | 1/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.63 |
| ▸ | LMNA | P02545 | 3/20 | 0.63 |
| ▸ | HPGD | P15428 | 3/20 | 0.63 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.63 |
| ▸ | HSD17B10 | Q99714 | 3/20 | 0.63 |
| ▸ | CA1 | P00915 | 2/20 | 0.63 |
| ▸ | CA2 | P00918 | 2/20 | 0.63 |
| ▸ | CDK2 | P24941 | 2/20 | 0.63 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.63 |
| ▸ | ADAMTS4 | O75173 | 1/20 | 0.63 |
| ▸ | FYN | P06241 | 1/20 | 0.63 |
| ▸ | MMP2 | P08253 | 1/20 | 0.63 |
| ▸ | MMP9 | P14780 | 1/20 | 0.63 |
| ▸ | MMP8 | P22894 | 1/20 | 0.63 |
| ▸ | CA6 | P23280 | 1/20 | 0.63 |
| ▸ | MMP12 | P39900 | 1/20 | 0.63 |
| ▸ | RECQL | P46063 | 1/20 | 0.63 |
| ▸ | ADAMTS5 | Q9UNA0 | 1/20 | 0.63 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Pyrogallol SCHEMBL214769 | 1.00 | ALDH1A1 (0.63) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL4255147 | 0.91 | CA1 (0.52) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL17768460 | 0.89 | ALDH1A1 (0.71) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL28963965 | 0.86 | ALDH1A1 (0.67) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| SCHEMBL27897384 | 0.86 | TRPA1 (0.74) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL1056082 | 0.85 | ALDH1A1 (0.57) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Catechol SCHEMBL11778548 | 0.83 | SMN1; SMN2 (0.59) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL28234833 | 0.83 | CA2 (0.71) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL16714223 | 0.80 | ALDH1A1 (0.57) | ALDH1A1LMNAHPGDALOX15HSD17B10 | |
| Pyrogallol SCHEMBL704091 | 0.80 | ALDH1A1 (0.57) | ALDH1A1LMNAHPGDALOX15HSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 109 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5994022-A | BECOMES SOLUBLE IN ALKALI DEVELOPING SOLUTION BY ACTION OF AN ACID | JSR CORPORATION (JP) | 1999-11-30 | — | — | US | claimed |
| US-20240199854-A1 | COMPOSITION, CURED FILM, STRUCTURAL BODY, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND MANUFACTURING METHOD OF CURED FILM | FUJIFLIM CORPORATION (JP) | 2024-06-20 | — | — | US | disclosed |
| WO-2024070845-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN SHEET, CURED PRODUCT, CURED PRODUCT PRODUCTION METHOD, SEMICONDUCTOR DEVICE, DISPLAY DEVICE, AND RESIN PRODUCTION METHOD | 東レ株式会社 | 2024-04-04 | — | — | WO | disclosed |
| WO-2023248887-A1 | POSITIVE TYPE PHOTOSENSITIVE RESIN COMPOSITION, POSITIVE TYPE PHOTOSENSITIVE RESIN SHEET, CURED PRODUCT, CURED PRODUCT MANUFACTURING METHOD, SEMICONDUCTOR DEVICE, AND DISPLAY DEVICE | 東レ株式会社 | 2023-12-28 | — | — | WO | disclosed |
| WO-2023032746-A1 | COMPOSITION, CURED FILM, STRUCTURE, OPTICAL FILTER, SOLID-STATE IMAGING ELEMENT, IMAGE DISPLAY DEVICE, AND METHOD FOR PRODUCING CURED FILM | 富士フイルム株式会社 | 2023-03-09 | — | — | WO | disclosed |
| EP-3203320-B9 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TORAY INDUSTRIES (JP) | 2020-05-06 | — | — | EP | disclosed |
| EP-3203320-B1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TORAY INDUSTRIES (JP) | 2019-10-23 | — | — | EP | disclosed |
| US-10409163-B2 | Photosensitive resin composition, cured film, element provided with cured film, and method for manufacturing semiconductor device | TORAY INDUSTRIES, INC. (JP) | 2019-09-10 | — | — | US | disclosed |
| EP-2799928-B1 | PHOTOSENSITIVE RESIN COMPOSITION AND PROCESS FOR PRODUCING SEMICONDUCTOR ELEMENT | TORAY INDUSTRIES (JP) | 2019-05-22 | — | — | EP | disclosed |
| US-20170285477-A1 | PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, ELEMENT PROVIDED WITH CURED FILM, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE | TORAY INDUSTRIES, INC. (JP) | 2017-10-05 | — | — | US | disclosed |
| EP-0843220-A1 | Radiation sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1998-05-20 | — | — | EP | disclosed |
| EP-0838727-A1 | Radiation sensitive composition | Clariant International Ltd. (CH) | 1998-04-29 | — | — | EP | disclosed |
| EP-0831369-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1998-03-25 | — | — | EP | disclosed |
| EP-0827970-A2 | New acid-labile group protected hydroxystyrene polymers or copolymers thereof and their application to radiation sensitive materials | Clariant AG (CH) | 1998-03-11 | — | — | EP | disclosed |
| US-5716756-A | POSITIVE OR NEGATIVE WORKING MIXTURES | HOECHST AKTIENGESELLSCHAFT (DE) | 1998-02-10 | — | — | US | disclosed |
| EP-0803775-A1 | Positive working photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-10-29 | — | — | EP | disclosed |
| EP-0795786-A2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-17 | — | — | EP | disclosed |
| EP-0794457-A2 | Positive working photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-10 | — | — | EP | disclosed |
| EP-0607899-A2 | Positive photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1994-07-27 | — | — | EP | disclosed |
| EP-0588544-A2 | Fine pattern forming material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-03-23 | — | — | EP | disclosed |