⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2536180 | 0.85 | — | — | |
| SCHEMBL445082 | 0.80 | HPGD (0.36) | — | |
| SCHEMBL7048673 | 0.79 | — | — | |
| SCHEMBL2540553 | 0.76 | GPR119 (0.31) | — | |
| SCHEMBL2536185 | 0.74 | HSD11B1 (0.31) | — | |
| SCHEMBL7049545 | 0.73 | — | — | |
| SCHEMBL3870284 | 0.73 | — | — | |
| Trifluoromethanesulfonic Acid SCHEMBL36177 | 0.72 | GPR3 (0.50) | — | |
| SCHEMBL51422 | 0.70 | CA2 (0.38) | — | |
| SCHEMBL1088652 | 0.69 | GPR3 (0.34) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030219680-A1 | Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams | JSR CORPORATION (JP) | 2003-11-27 | — | — | US | disclosed |