SCHEMBL705287

SCHEMBL705287

CCc1ccccc1C(C)O[SiH3]

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
L3MBTL1 Q9Y468 1/20 0.39
ADRA2A P08913 4/20 0.37
ADRA2B P18089 4/20 0.37
ADRA2C P18825 4/20 0.37
GABRA1 P14867 2/20 0.35
GABRB2 P47870 2/20 0.35
TSHR P16473 1/20 0.35
HTT P42858 1/20 0.34
CYP3A4 P08684 2/20 0.33
CYP2D6 P10635 1/20 0.33
SLC6A2 P23975 1/20 0.33
SLC6A4 P31645 1/20 0.33
SLC6A3 Q01959 1/20 0.33
KCNH2 Q12809 1/20 0.33
OPRM1 P35372 1/20 0.33
OPRD1 P41143 1/20 0.33
OPRK1 P41145 1/20 0.33
OPRL1 P41146 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL708783 0.85 ADRA2A (0.51) ADRA2AADRA2BADRA2CTSHR
SCHEMBL8750403 0.83 MAPT (0.41) MAPTNPSR1L3MBTL1ADRA2AADRA2B
SCHEMBL704243 0.83 GABRA1 (0.36) MAPTNPSR1L3MBTL1ADRA2AADRA2B
SCHEMBL706042 0.82 ADRA2A (0.43) ADRA2AADRA2BADRA2CCYP3A4CYP2D6
SCHEMBL3482119 0.80 CYSLTR2 (0.47) ADRA2AADRA2BADRA2C
SCHEMBL11786791 0.80 GABRA1 (0.40) MAPTNPSR1L3MBTL1ADRA2AADRA2B
SCHEMBL15127472 0.80 MAPT (0.39) MAPTNPSR1L3MBTL1ADRA2AADRA2B
SCHEMBL6699017 0.79 SLC6A2 (0.42) ADRA2ASLC6A2SLC6A4SLC6A3
SCHEMBL707358 0.78 MAPT (0.38) MAPTNPSR1L3MBTL1GABRA1GABRB2
SCHEMBL16541142 0.78 ADRA2C (0.53) MAPTNPSR1ADRA2AADRA2BADRA2C

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109641482-B Preparation of cis-1, 4-polydienes having multiple silane functional groups prepared by in situ hydrosilylation of polymer glues 株式会社普利司通 2021-11-05 CN disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed