SCHEMBL706201

SCHEMBL706201

Cc1ccccc1[SiH2]OC(C)C

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACHE P22303 2/20 0.38
TSHR P16473 2/20 0.38
ESR1 P03372 1/20 0.35
ALDH1A1 P00352 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA7 P43166 1/20 0.31
CA9 Q16790 1/20 0.31
SCN4A P35499 3/20 0.31
CYP3A4 P08684 2/20 0.31
SLC6A4 P31645 2/20 0.31
LMNA P02545 1/20 0.31
CYP1A2 P05177 1/20 0.31
CYP2D6 P10635 1/20 0.31
CYP2C9 P11712 1/20 0.31
NFKB1 P19838 1/20 0.31
KCNK3 O14649 1/20 0.31
CACNA1F O60840 1/20 0.31
KCNK2 O95069 1/20 0.31
GBA1 P04062 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2961097 0.86 ALDH1A1 (0.32) ALDH1A1
SCHEMBL713415 0.83 TRPA1 (0.35) TSHRSCN4ACYP3A4SLC6A4LMNA
SCHEMBL855227 0.82 TSHR (0.33) ACHETSHRESR1SLC6A4SLC6A2
SCHEMBL1315377 0.79 NPC1 (0.32) ALDH1A1CA1CA2CA7CA9
SCHEMBL706902 0.77 GABRA1 (0.40) TSHRESR1ALDH1A1CA1CA2
SCHEMBL1314473 0.76 TSHR (0.32) ACHETSHRESR1
SCHEMBL1639607 0.76
SCHEMBL28351568 0.75 CA1 (0.46) ACHETSHRALDH1A1CA1CA2
SCHEMBL7935157 0.75 TSHR (0.43) ACHETSHRESR1ALDH1A1CA1
SCHEMBL707826 0.74 MGLL (0.36) TSHRALDH1A1SLC6A4LMNAMAOA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11807758-B2 Siloxane polymer and method of producing siloxane polymer JNC CORPORATION (JP) 2023-11-07 US disclosed
US-20210238419-A1 SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER JNC CORPORATION (JP) 2021-08-05 US disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed