SCHEMBL707648

SCHEMBL707648

CC(C)(C)C(CCO[SiH3])(c1ccccc1)C(C)(C)C

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.39
ALDH1A1 P00352 2/20 0.36
TAAR1 Q96RJ0 1/20 0.36
ALOX15 P16050 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.34
KIF11 P52732 2/20 0.33
CYP2C19 P33261 1/20 0.33
HIF1A Q16665 1/20 0.33
ESR1 P03372 2/20 0.31
ESR2 Q92731 2/20 0.31
CYP3A4 P08684 1/20 0.31
KCNN4 O15554 1/20 0.31
CHRM2 P08172 1/20 0.31
CHRM4 P08173 1/20 0.31
CHRM5 P08912 1/20 0.31
CHRM1 P11229 1/20 0.31
CHRM3 P20309 1/20 0.31
SIGMAR1 Q99720 1/20 0.31
SLC6A4 P31645 1/20 0.31
SLC6A3 Q01959 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL703821 0.89 MAPK1 (0.36) MAPK1ALDH1A1TAAR1ALOX15SMN1; SMN2
SCHEMBL703502 0.80 MAPK1 (0.41) MAPK1ALDH1A1TAAR1ALOX15SMN1; SMN2
SCHEMBL1316194 0.78 MAPK1 (0.36) MAPK1ALDH1A1TAAR1ALOX15SMN1; SMN2
SCHEMBL706645 0.77 KCNN4 (0.35) MAPK1ALDH1A1TAAR1ALOX15SMN1; SMN2
SCHEMBL708503 0.76 SCN1A (0.37) MAPK1ALDH1A1TAAR1ALOX15KIF11
SCHEMBL703111 0.75 KIF11 (0.48) MAPK1KIF11CYP2C19CYP3A4CHRM2
SCHEMBL3481611 0.74 CYP2C19 (0.39) MAPK1ALDH1A1TAAR1ALOX15SMN1; SMN2
SCHEMBL708789 0.73 LTA4H (0.37) KIF11CYP2C19ESR1ESR2CYP3A4
SCHEMBL3482253 0.73 SCN1A (0.35) MAPK1KIF11CYP2C19CYP3A4KCNN4
SCHEMBL23701252 0.72 TSHR (0.41) MAPK1ALDH1A1TAAR1ALOX15KIF11

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed