SCHEMBL7096720

SCHEMBL7096720

C=C(CCCNC(=O)Nc1ccc(C)c(O)c1)C(=O)O

nearest known ligand 0.50

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.50
CYP1A2 P05177 3/20 0.50
CYP2C9 P11712 3/20 0.50
CYP2C19 P33261 3/20 0.50
CYP2D6 P10635 2/20 0.50
EPHX2 P34913 2/20 0.48
MAPT P10636 1/20 0.48
SLC6A3 Q01959 1/20 0.46
KMT2A Q03164 3/20 0.45
CYP3A4 P08684 2/20 0.45
MEN1 O00255 2/20 0.45
GAA P10253 1/20 0.45
EPHX1 P07099 3/20 0.43
LMNA P02545 2/20 0.43
RAB9A P51151 2/20 0.42
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA9 Q16790 1/20 0.41
HTT P42858 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7098367 0.96 EPHX2 (0.50) ALDH1A1CYP1A2CYP2C9CYP2C19CYP2D6
SCHEMBL7098035 0.95 EPHX2 (0.52) ALDH1A1CYP1A2CYP2C9CYP2C19CYP2D6
SCHEMBL7099121 0.92 ALDH1A1 (0.51) ALDH1A1CYP1A2CYP2C9CYP2C19CYP2D6
SCHEMBL8550840 0.83 ALDH1A1 (0.60) ALDH1A1CYP1A2CYP2C9CYP2C19SLC6A3
SCHEMBL4942260 0.81 MAOA (0.47) ALDH1A1CYP1A2CYP2C9CYP2C19KMT2A
SCHEMBL7098401 0.80 MARS1 (0.55) ALDH1A1CYP1A2EPHX2MAPTKMT2A
SCHEMBL8549833 0.78 EPHX1 (0.60) ALDH1A1CYP1A2CYP2C9CYP2C19EPHX2
SCHEMBL8550250 0.78 EPHX2 (0.50) ALDH1A1CYP1A2CYP2C9CYP2C19EPHX2
SCHEMBL7097155 0.78 LMNA (0.51) ALDH1A1CYP1A2CYP2C9CYP2C19KMT2A
SCHEMBL7097508 0.78 GAA (0.53) MAPTKMT2AMEN1GAARAB9A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0737896-B1 Photosensitive composition and photosensitive planographic printing plate KODAK POLYCHROME GRAPHICS JP (JP) 2003-08-27 EP disclosed
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed