Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MTNR1A | P48039 | 1/20 | 0.48 |
| ▸ | MTNR1B | P49286 | 1/20 | 0.48 |
| ▸ | NCEH1 | Q6PIU2 | 7/20 | 0.47 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.45 |
| ▸ | GAA | P10253 | 2/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.44 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 3/20 | 0.44 |
| ▸ | HPGD | P15428 | 3/20 | 0.44 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.43 |
| ▸ | SLC22A6 | Q4U2R8 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.43 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.43 |
| ▸ | MITF | O75030 | 1/20 | 0.43 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Formamide SCHEMBL9731210 | 0.94 | MTNR1A (0.44) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL3268742 | 0.86 | MAPT (0.60) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL7888114 | 0.81 | MTNR1A (0.43) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL2551627 | 0.81 | MTNR1A (0.51) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL2551628 | 0.81 | MTNR1A (0.51) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL1087812 | 0.79 | ALDH1A1 (0.46) | GAATDP1L3MBTL1MAPTHPGD | |
| SCHEMBL7524368 | 0.78 | ALDH1A1 (0.52) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL7526612 | 0.78 | ALDH1A1 (0.52) | MTNR1AMTNR1BNCEH1CYP1A2CYP2C9 | |
| SCHEMBL12199931 | 0.78 | MAPT (0.58) | NCEH1CYP1A2CYP2C9CYP2C19CYP3A4 | |
| SCHEMBL3698427 | 0.78 | KDM4E (0.63) | MTNR1AMTNR1BCYP1A2CYP2C9CYP2C19 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 656 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-28 | — | — | US | disclosed |
| CN-116560190-B | Resist material and pattern forming method | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-26 | — | — | CN | disclosed |
| US-20260139086-A1 | ONIUM SALT TYPE MONOMER, MONOMERIC PHOTO-ACID GENERATOR, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-21 | — | — | US | disclosed |
| US-20260133491-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260133490-A1 | SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-14 | — | — | US | disclosed |
| US-20260133492-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-14 | — | — | US | disclosed |
| CN-122010809-A | Onium salt type monomer, polymer, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-12625429-B2 | Resist composition and pattern forming process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-05-12 | — | — | US | disclosed |
| CN-122010808-A | Onium salt type monomer, polymer, chemically amplified resist composition, and pattern forming method | 信越化学工业株式会社 | 2026-05-12 | — | — | CN | disclosed |
| US-20260110967-A1 | SULFONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2026-04-23 | — | — | US | disclosed |
| US-7887991-B2 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2011-02-15 | — | — | US | disclosed |
| US-20100227273-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-20100227274-A1 | POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-09-09 | — | — | US | disclosed |
| US-7655378-B2 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2010-02-02 | — | — | US | disclosed |
| US-20090297979-A1 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-12-03 | — | — | US | disclosed |
| US-20090202940-A1 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20090202947-A1 | Positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO.,LTD (JP) | 2009-08-13 | — | — | US | disclosed |
| US-20080020290-A1 | Negative resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20080020289-A1 | Novel polymer, positive resist composition and patterning process using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2008-01-24 | — | — | US | disclosed |
| US-20070032525-A1 | Piperidine derivatives having ccr3 antagonism | TEIJIN LIMITED, A JAPANESE BODY CORPORATE (JP) | 2007-02-08 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (9 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12625429-B2 | Resist composition and pattern forming process | NAF1, CLIC1, H1-4 | MTNR1A 526/4885MTNR1B 960/4885NCEH1 2131/4885 |
| US-20260133492-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | CACNA1F, NAF1, NSUN2 | MTNR1A 1727/4885MTNR1B 2266/4885NCEH1 1608/4885 |
| US-20070032525-A1 | Piperidine derivatives having ccr3 antagonism | CCR3, CCR1, CCR4 | MTNR1A 595/4885MTNR1B 720/4885NCEH1 726/4885 |
| US-20260133491-A1 | ONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | AGTR1, NAF1, NHERF1 | MTNR1A 2089/4885MTNR1B 2621/4885NCEH1 928/4885 |
| US-20260133490-A1 | SULFONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION AND PATTERN FORMING PROCESS | NAF1, FOXM1, CACNA1F | MTNR1A 1537/4885MTNR1B 2008/4885NCEH1 2578/4885 |
| US-20260147274-A1 | SULFONIUM SALT TYPE MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | RSU1, ETV6, NAF1 | MTNR1A 1626/4885MTNR1B 2065/4885NCEH1 2907/4885 |
| US-20090297979-A1 | Polymerizable compound, polymer, positive resist composition, and patterning process using the same | PRRC2A, PUF60, POLR2B | MTNR1A 4126/4885MTNR1B 4047/4885NCEH1 4105/4885 |
| US-20260139086-A1 | ONIUM SALT TYPE MONOMER, MONOMERIC PHOTO-ACID GENERATOR, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS | CLTA, ARCN1, CLTB | MTNR1A 2732/4885MTNR1B 3019/4885NCEH1 2781/4885 |
| US-20260110967-A1 | SULFONIUM SALT MONOMER, POLYMER, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERN FORMING PROCESS | NSUN2, NAF1, SNU13 | MTNR1A 2057/4885MTNR1B 2656/4885NCEH1 1955/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.