SCHEMBL712868

SCHEMBL712868

CC1CC2CC(C1=O)C2(C)C

nearest known ligand 0.38

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.38
MAPK1 P28482 1/20 0.38
CRBN Q96SW2 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL19621509 1.00 TSHR (0.38) TSHRMAPK1CRBN
SCHEMBL3707344 0.76 TSHR (0.36) TSHRMAPK1
SCHEMBL19621415 0.76 TSHR (0.36) TSHRMAPK1
SCHEMBL12812311 0.76 TSHR (0.36) TSHRMAPK1
SCHEMBL13255134 0.76 TSHR (0.41) TSHRMAPK1
SCHEMBL14186834 0.72 TSHR (0.34) TSHRMAPK1
SCHEMBL14174371 0.67 CYP19A1 (0.33) TSHRMAPK1
SCHEMBL5051698 0.67 CYP19A1 (0.33) TSHRMAPK1
SCHEMBL7895665 0.67 TP53 (0.33) TSHRMAPK1
SCHEMBL6861301 0.67 OPRK1 (0.38) TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12458918-B2 Process and apparatus for treating methane-containing gas KANADEVIA INOVA AG (CH) 2025-11-04 US disclosed
US-20250262588-A1 PROCESS AND APPARATUS FOR TREATING METHANE-CONTAINING GAS KANADEVIA INOVA AG (CH) 2025-08-21 US disclosed
EP-4536380-A1 PROCESS AND APPARATUS FOR TREATING METHANE-CONTAINING GAS Kanadevia Inova AG (CH) 2025-04-16 EP disclosed
US-20240390446-A1 COMPOSITIONS AND METHODS FOR TREATING OR PREVENTING INFLAMMATORY DISEASES INCLUDING DIABETES AND THYROID DISEASES ALKALAY RACHEL (IL) 2024-11-28 US disclosed
US-20240226218-A1 COMPOSITIONS AND METHODS FOR TREATING AND PREVENTING A CORONAVIRUS INFECTION Novel Concepts Medical Ltd (IL) 2024-07-11 US disclosed
WO-2023237568-A1 PROCESS AND APPARATUS FOR TREATING METHANE-CONTAINING GAS HITACHI ZOSEN INOVA AG (CH) 2023-12-14 WO disclosed
EP-4289498-A1 METHOD AND DEVICE FOR THE TREATMENT OF GAS CONTAINING METHANE Hitachi Zosen Inova AG (CH) 2023-12-13 EP disclosed
US-20230346866-A1 COMPOSITIONS AND METHODS FOR TREATING AND PREVENTING NON-MALIGNANT RESPIRATORY DISEASE Novel Concepts Medical Ltd (IL) 2023-11-02 US disclosed
US-20230181665-A1 TREATING OR PREVENTING INFLAMMATORY DISEASES INCLUDING DIABETES MELLITUS 10 TYPE I AND TYPE II AND THYROID DISEASES Novel Concepts Medical Ltd (IL) 2023-06-15 US disclosed
US-20230134432-A1 COMPOSITIONS AND METHODS FOR TREATING SOLID AND SOFT TUMORS AND PROLIFERATIVE DISEASES Novel Concepts Medical Ltd (IL) 2023-05-04 US disclosed
US-20080193874-A1 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-08-14 US disclosed
US-20080176168-A1 CHEMICALLY AMPLIFIED RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-07-24 US disclosed
US-20080166660-A1 Having acrylic ester functionality with acid labile ester ring functionality and sulfonium sulfonate acid salt; high resolution semiconductor microfabrication patterns; excimer laser lithography SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-07-10 US disclosed
US-20080081293-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2008-04-03 US disclosed
EP-1873143-A1 A salt suitable for an acid generator and a chemically amplified resist composition containing the same Sumitomo Chemical Company, Limited (JP) 2008-01-02 EP disclosed
US-20070218401-A1 liquid immersion lithography, solves problem of defect caused by residual fluid droplets on the resist film; blend of resin containing no fluorine and acid labile group, and an acrylic fluoro-copolymer with units of a fluoromonomer and units of acid labile, lactone, or hydroxy-functional group SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-09-20 US disclosed
US-20070027336-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2007-02-01 US disclosed
US-20050181080-A1 Chinese traditional medicines for psoriasis HUANG HSU-SHAN (TW) 2005-08-18 US disclosed
US-20030165533-A1 Chinese traditional medicines for psoriasis HUANG HSU-SHAN (TW) 2003-09-04 US disclosed
US-20030152588-A1 Chinese traditional medicines for psoriasis HUANG HSU-SHAN (TW) 2003-08-14 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20070027336-A1 Salt suitable for an acid generator and a chemically amplified resist composition containing the same SLC26A3, NHERF1, HCN4 TSHR 2167/4885MAPK1 1937/4885CRBN 1594/4885
US-20080081293-A1 Salt suitable for an acid generator and a chemically amplified positive resist composition containing the same HCN3, HCN1, NHERF1 TSHR 618/4885MAPK1 1437/4885CRBN 1935/4885
US-20240390446-A1 COMPOSITIONS AND METHODS FOR TREATING OR PREVENTING INFLAMMATORY DISEASES INCLUDING DIABETES AND THYROID DISEASES TPO, TNF, ADAMTS13 TSHR 12/4885MAPK1 1771/4885CRBN 3602/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.