Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.72 |
| ▸ | ESR1 | P03372 | 1/20 | 0.72 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.72 |
| ▸ | ESR2 | Q92731 | 1/20 | 0.72 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.56 |
| ▸ | TSHR | P16473 | 2/20 | 0.56 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.56 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.56 |
| ▸ | CHEK1 | O14757 | 1/20 | 0.56 |
| ▸ | FYN | P06241 | 1/20 | 0.56 |
| ▸ | PDGFRB | P09619 | 1/20 | 0.56 |
| ▸ | PIM1 | P11309 | 1/20 | 0.56 |
| ▸ | FGFR1 | P11362 | 1/20 | 0.56 |
| ▸ | FLT1 | P17948 | 1/20 | 0.56 |
| ▸ | GRK5 | P34947 | 1/20 | 0.56 |
| ▸ | MAP2K2 | P36507 | 1/20 | 0.56 |
| ▸ | MAPK8 | P45983 | 1/20 | 0.56 |
| ▸ | CDK8 | P49336 | 1/20 | 0.56 |
| ▸ | RPS6KA3 | P51812 | 1/20 | 0.56 |
| ▸ | PRKX | P51817 | 1/20 | 0.56 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28393601 | 0.88 | ALDH1A1 (0.58) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL2095353 | 0.84 | CYP3A4 (0.53) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL75695 | 0.84 | ESR1 (1.00) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL5936700 | 0.84 | ALDH1A1 (0.73) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL1682512 | 0.83 | HIF1A (0.53) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL5329346 | 0.83 | KIF11 (0.53) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL3228621 | 0.82 | CYP2C19 (0.52) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL7127992 | 0.82 | CYP2C19 (0.52) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL7125049 | 0.82 | CYP2C19 (0.52) | ALDH1A1ESR1CYP3A4ESR2HIF1A | |
| SCHEMBL8698880 | 0.81 | ALDH1A1 (0.50) | ALDH1A1ESR1CYP3A4ESR2HIF1A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 251 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2000851-B1 | Photomask blank, resist pattern forming process, and photomask preparation process | SHINETSU CHEMICAL CO (JP) | 2015-07-29 | — | — | EP | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8968979-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8795942-B2 | Positive resist composition and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-08-05 | — | — | US | disclosed |
| US-8741548-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8741548-B2 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2014-06-03 | — | — | US | disclosed |
| US-8420290-B2 | Acetal compounds and their preparation, polymers, resist compositions and patterning process | SHIN-ETSU CHEMICAL CO., LTD (JP) | 2013-04-16 | — | — | US | disclosed |
| US-8343694-B2 | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-8343694-B2 | Photomask blank, resist pattern forming process, and photomask preparation process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2013-01-01 | — | — | US | disclosed |
| US-20070020540-A1 | Silane-phenol compound, overcoat formulation, and electrophotographic imaging member | XEROX CORPORATION | 2007-01-25 | — | — | US | disclosed |
| US-20070020540-A1 | Silane-phenol compound, overcoat formulation, and electrophotographic imaging member | XEROX CORPORATION | 2007-01-25 | — | — | US | disclosed |
| US-20070020539-A1 | Imaging member | XEROX CORPORATION | 2007-01-25 | — | — | US | disclosed |
| US-20070020539-A1 | Imaging member | XEROX CORPORATION | 2007-01-25 | — | — | US | disclosed |
| US-20070015072-A1 | Imaging members | XEROX CORPORATION | 2007-01-18 | — | — | US | disclosed |
| US-20070015072-A1 | Imaging members | XEROX CORPORATION | 2007-01-18 | — | — | US | disclosed |
| EP-1744220-A2 | Imaging Members | Xerox Corporation (US) | 2007-01-17 | — | — | EP | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| US-7157207-B2 | Polymer, resist material and patterning processing | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2007-01-02 | — | — | US | disclosed |
| EP-0646568-B1 | Tertiary butyl 4,4-bis(4'-hydroxyphenyl) pentanoate derivatives and positive resist materials containing the same | SHINETSU CHEMICAL CO (JP) | 1998-12-23 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20070020540-A1 | Silane-phenol compound, overcoat formulation, and electrophotographic imaging member | ARNT, STUB1, FLOT1 | ALDH1A1 1207/4885ESR1 466/4885CYP3A4 2978/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.