SCHEMBL75489

SCHEMBL75489

C=C(C)C(=O)OCC12CC3CC(CC(CO)(C3)C1)C2

nearest known ligand 0.47

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.40
GAA P10253 1/20 0.40
THRB P10828 1/20 0.39
MEN1 O00255 3/20 0.38
KMT2A Q03164 3/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
LMNA P02545 1/20 0.35
TSHR P16473 1/20 0.34
CA12 O43570 1/20 0.34
CA1 P00915 1/20 0.34
CA2 P00918 1/20 0.34
CA9 Q16790 1/20 0.34
USP2 O75604 1/20 0.33
MAPT P10636 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL684276 0.94 ALDH1A1 (0.44) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL949824 0.90 ALDH1A1 (0.37) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL678286 0.88 ALDH1A1 (0.39) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL4873600 0.87 ALDH1A1 (0.39) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL10150635 0.85 ALDH1A1 (0.40) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL76909 0.85 ALDH1A1 (0.40) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL16708446 0.85 ALDH1A1 (0.39) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL12576381 0.84 ALDH1A1 (0.43) ALDH1A1GAATHRBMEN1KMT2A
SCHEMBL20349638 0.84 ALDH1A1 (0.54) ALDH1A1THRBMEN1KMT2AL3MBTL1
SCHEMBL3797993 0.84 ALDH1A1 (0.54) ALDH1A1THRBMEN1KMT2AL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 166 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2554555-B1 METHODS FOR PRODUCING AN ADAMANTYL (METH)ACRYLATE MONOMER AND A (METH)ACRYLIC COPOLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER MITSUBISHI GAS CHEMICAL CO (JP) 2019-09-18 EP claimed
EP-2907156-B1 IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING CANON KK (JP) 2019-04-10 EP claimed
US-20150315322-A1 IMPRINTING METHOD AND CURABLE COMPOSITION FOR IMPRINTING CANON KABUSHIKI KAISHA (JP) 2015-11-05 US claimed
US-9133330-B2 Composition for use as material for electrical or electronic parts, and cured product thereof KANEKA CORPORATION (JP) 2015-09-15 US claimed
US-8846840-B2 Adamantyl (meth)acrylic monomer and (meth)acrylic polymer containing the same as repeating unit MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2014-09-30 US claimed
EP-2554555-A1 ADAMANTYL (METH)ACRYLATE MONOMER AND (METH)ACRYLIC POLYMER THAT CONTAINS REPEATING UNITS DERIVED FROM THE MONOMER Mitsubishi Gas Chemical Company, Inc. (JP) 2013-02-06 EP claimed
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2013-01-24 US claimed
US-20240191088-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2024-06-13 US disclosed
WO-2024116787-A1 CURABLE COMPOSITION, FILM FORMING METHOD, AND ARTICLE MANUFACTURING METHOD キヤノン株式会社 2024-06-06 WO disclosed
WO-2024111521-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2024-05-30 WO disclosed
WO-2024106268-A1 CURABLE COMPOSITION, FILM FORMATION METHOD, PATTERN FORMATION METHOD, AND ARTICLE PRODUCTION METHOD キヤノン株式会社 2024-05-23 WO disclosed
EP-4354488-A1 CURABLE COMPOSITION, FILM FORMATION METHOD, AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2024-04-17 EP disclosed
US-20240101842-A1 CURABLE COMPOSITION, FILM FORMING METHOD AND ARTICLE MANUFACTURING METHOD CANON KABUSHIKI KAISHA (JP) 2024-03-28 US disclosed
US-20080009647-A1 Adamantane Derivative, Process for Producing the Same, and Photosensitive Material for Photoresist IDEMITSU KOSAN CO., LTD. (JP) 2008-01-10 US disclosed
US-20070172772-A1 Microlens OMRON CORPORATION (JP) 2007-07-26 US disclosed
EP-1803708-A1 ADAMANTANE DERIVATIVE, PROCESS FOR PRODUCING THE SAME, AND PHOTOSENSITIVE MATERIAL FOR PHOTORESIST IDEMITSU KOSAN CO., LTD. (JP) 2007-07-04 EP disclosed
US-20070129532-A1 Adamantane derivatives and process for producing the same IDEMITSU KOSAN CO., LTD (JP) 2007-06-07 US disclosed
EP-1767539-A1 ORGANIC ANTIMONY COMPOUND, PROCESS FOR PRODUCING THE SAME, LIVING RADICAL POLYMERIZATION INITIATOR, PROCESS FOR PRODUCING POLYMER USING THE SAME, AND POLYMER OTSUKA CHEMICAL COMPANY, LTD. (JP) 2007-03-28 EP disclosed
CN-1914147-A Adamantane derivative and process for producing the same IDEMITSU KOSAN CO (JP) 2007-02-14 CN disclosed
EP-1712542-A1 ADAMANTANE DERIVATIVES AND PROCESS FOR PRODUCING THE SAME IDEMITSU KOSAN CO., LTD. (JP) 2006-10-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20080009647-A1 Adamantane Derivative, Process for Producing the Same, and Photosensitive Material for Photoresist LSS, C1S, DHPS ALDH1A1 1544/4885GAA 1997/4885THRB 4663/4885
US-20130023638-A1 ADAMANTYL (METH)ACRYLIC MONOMER AND (METH)ACRYLIC POLYMER CONTAINING THE SAME AS REPEATING UNIT METTL3, METTL16, METTL14 ALDH1A1 238/4885GAA 3781/4885THRB 1126/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.