Benzil

Benzil

SCHEMBL7571874

O.O=C(C(=O)c1ccccc1)c1ccccc1.O=C(C(=O)c1ccccc1)c1ccccc1

nearest known ligand 0.93

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Benzil. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PARP1 known ✓ P09874 1/20 0.55
MEN1 known ✓ O00255 1/20 0.52
CES2 O00748 12/20 0.93
CES1 P23141 12/20 0.93
TSHR P16473 2/20 0.61
DAO P14920 1/20 0.61
NAPRT Q6XQN6 1/20 0.61
ALDH1A1 P00352 1/20 0.61
RAB9A P51151 1/20 0.58
CYP3A4 P08684 2/20 0.55
MAPT P10636 2/20 0.55
TDP1 Q9NUW8 2/20 0.55
CA2 P00918 2/20 0.55
CA4 P22748 2/20 0.55
POLB P06746 1/20 0.55
CYP2C19 P33261 1/20 0.55
RECQL P46063 1/20 0.55
BLM P54132 1/20 0.55
PMP22 Q01453 1/20 0.55
HSD17B10 Q99714 1/20 0.55

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Benzil SCHEMBL27539146 1.00 CES2 (0.93) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL28475956 0.97 CES2 (1.00) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL2156589 0.97 CES2 (1.00) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL9517636 0.97 CES2 (1.00) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL7142843 0.97 CES2 (1.00) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL66 0.97 CES2 (1.00) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL1002038 0.93 CES2 (0.93) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL4957522 0.93 CES2 (1.00) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL10996187 0.93 CES2 (0.93) CES2CES1TSHRDAONAPRT
Benzil SCHEMBL1311689 0.93 CES2 (0.93) CES2CES1TSHRDAONAPRT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-109536087-A Optics pressure sensitive adhesive and preparation method thereof 苏州凡赛特材料科技有限公司 2019-03-29 CN claimed
US-5082914-A Solvent resistant hard protective coating EASTMAN KODAK COMPANY (US) 1992-01-21 US claimed
CN-117835533-A Photosensitive element, laminate, method for producing same, method for forming resist pattern, and method for producing printed wiring board 株式会社力森诺科 2024-04-05 CN disclosed
CN-117229496-A Amphiphilic alternating main chain polymer containing benzil phosphorescent groups and preparation method thereof 华东理工大学 2023-12-15 CN disclosed
CN-116444702-A Preparation method of polyisobutene oil for viscosity standard substance 山东非金属材料研究所 2023-07-18 CN disclosed
CN-110511022-A A kind of high solid loading zirconia ceramics creme and preparation method, and structural member and preparation method based on it NAT INSTITUTE CORPORATION OF ADDITIVE MANUFACTURING XIAN 2019-11-29 CN disclosed
CN-109810638-A A kind of low-refraction optics pressure sensitive adhesive and its preparation method and application 苏州凡赛特材料科技有限公司 2019-05-28 CN disclosed
CN-105037629-A Silicone hydrogel with good resilience and preparation method and application method therefor UNIV SOUTHEAST 2015-11-11 CN disclosed
CN-102675561-B silicone hydrogel with high water content FAR EASTERN NEW CENTURY CORPORATION (CN) 2014-10-22 CN disclosed
CN-102115515-B Copolymer for improving wettability of silicone hydrogel, silicone hydrogel composition containing same and ophthalmic article prepared therefrom FAR EASTERN NEW CENTURY CORP 2014-06-18 CN disclosed
US-20140044962-A1 ADHESIVE COMPOSITION, FILM ADHESIVE, AND BONDING METHOD TOKYO OHKA KOGYO CO., LTD. (JP) 2014-02-13 US disclosed
CN-102675561-A Silicone hydrogel with high water content FAR EASTERN NEW CENTURY CORP 2012-09-19 CN disclosed
CN-102675658-A Method for preparing polysiloxane hydrogel with high moisture content FAR EASTERN NEW CENTURY CORP 2012-09-19 CN disclosed
CN-102464744-A Chlorinated polymers that enhance wettability of silicone hydrogels, silicone hydrogels comprising the same, and ophthalmic articles made therefrom FAR EASTERN NEW CENTURY CORP 2012-05-23 CN disclosed
CN-102115515-A Copolymer for improving wettability of silicone hydrogel, silicone hydrogel composition containing same and ophthalmic article prepared therefrom FAR EASTERN NEW CENTURY CORP 2011-07-06 CN disclosed
EP-0854024-B1 Thin-film fabrication method and apparatus NAT INST OF ADVANCED IND SCIEN (JP) 2002-09-18 EP disclosed
US-6319321-B1 Thin-film fabrication method and apparatus AGENCY OF INDUSTRIAL SCIENCE & TECHNOLOGY MINISTRY OF INTERNATIONAL TRADE & INDUSTRY (JP) 2001-11-20 US disclosed
CN-1074705-C Coated abrastive article and method of making same MINNESOTA MINING & MFG (US) 2001-11-14 CN disclosed
EP-0854024-A2 Thin-film fabrication method and apparatus Agency of Industrial Science and Technology of Ministry of International Trade and Industry (JP) 1998-07-22 EP disclosed
CN-1074637-A Coated abrasive article and preparation method thereof MINNESOTA MINING & MFG (US) 1993-07-28 CN disclosed