SCHEMBL7582840

SCHEMBL7582840

CCS(=O)(=O)O[I+](c1ccccc1)c1ccc(OC)cc1

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTT P42858 1/20 0.43
ALDH1A1 P00352 3/20 0.41
CA4 P22748 1/20 0.41
LTA4H P09960 2/20 0.41
HSD11B1 P28845 1/20 0.40
CNR1 P21554 2/20 0.39
CNR2 P34972 2/20 0.39
POLB P06746 1/20 0.39
PKM P14618 1/20 0.39
PTGS2 P35354 1/20 0.39
PPARG P37231 1/20 0.39
NFE2L2 Q16236 1/20 0.39
CES2 O00748 1/20 0.39
CES1 P23141 1/20 0.39
BACE1 P56817 1/20 0.38
MMP2 P08253 1/20 0.38
MMP8 P22894 1/20 0.38
MMP12 P39900 1/20 0.38
MMP13 P45452 1/20 0.38
MMP14 P50281 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7576454 0.89 HTT (0.40) HTTALDH1A1CA4LTA4HHSD11B1
SCHEMBL4452958 0.88 PSIP1 (0.40) HTTALDH1A1HSD11B1L3MBTL1
SCHEMBL4654652 0.84 PTGS2 (0.39) HTTALDH1A1CNR1CNR2PTGS2
SCHEMBL7574614 0.83 CA4 (0.43) HTTALDH1A1CA4LTA4HHSD11B1
SCHEMBL5707386 0.83 LMNA (0.34) HTTALDH1A1CNR2PPARG
SCHEMBL4655792 0.81 HTT (0.45) HTTALDH1A1CA4LTA4HHSD11B1
SCHEMBL361657 0.79 KMT2A (0.40) HTTALDH1A1CA4LTA4HHSD11B1
SCHEMBL2634850 0.79 LMNA (0.50) HTTALDH1A1CA4POLBPKM
SCHEMBL7573544 0.76 PSIP1 (0.36) HTTALDH1A1PKMMMP2MMP14
SCHEMBL2901030 0.76 CA12 (0.39) HTTALDH1A1CA4LTA4HHSD11B1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed