SCHEMBL7573544

SCHEMBL7573544

CCCS(=O)(=O)O[I+](c1ccccc1)c1ccccc1

nearest known ligand 0.38

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
PSIP1 O75475 1/20 0.36
TDP1 Q9NUW8 1/20 0.36
GAA P10253 2/20 0.34
LMNA P02545 2/20 0.33
HTT P42858 1/20 0.33
PKM P14618 1/20 0.33
PTGS1 P23219 1/20 0.32
PABPC1 P11940 1/20 0.32
EIF4H Q15056 1/20 0.32
CTDSP1 Q9GZU7 1/20 0.32
KMT2A Q03164 1/20 0.32
MMP2 P08253 1/20 0.31
MMP7 P09237 1/20 0.31
MMP9 P14780 1/20 0.31
MMP14 P50281 1/20 0.31
ABCB1 P08183 1/20 0.31
ALDH1A1 P00352 1/20 0.31
TSHR P16473 1/20 0.31
SMN1; SMN2 Q16637 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7576454 0.89 HTT (0.40) TDP1LMNAHTTALDH1A1SMN1; SMN2
SCHEMBL4452958 0.86 PSIP1 (0.40) PSIP1TDP1LMNAHTTKMT2A
SCHEMBL452107 0.86 MMP1 (0.37) TDP1HTTMMP9ABCB1ALDH1A1
SCHEMBL4654652 0.78 PTGS2 (0.39) HTTMMP2MMP9ALDH1A1
SCHEMBL4654700 0.76 ALDH1A1 (0.46) GAALMNAHTTKMT2AALDH1A1
SCHEMBL7582840 0.76 HTT (0.43) HTTPKMMMP2MMP14ALDH1A1
SCHEMBL1628636 0.74 KEAP1 (0.37) PSIP1TDP1ALDH1A1TSHRSMN1; SMN2
SCHEMBL5707386 0.73 LMNA (0.34) PSIP1LMNAHTTABCB1ALDH1A1
SCHEMBL2895360 0.71 MCHR1 (0.40) GAAHTTALDH1A1SMN1; SMN2
SCHEMBL249114 0.71 KMT2A (0.57) TDP1LMNAHTTPTGS1PABPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed