SCHEMBL7584568

SCHEMBL7584568

CCCS(=O)(=O)[O-].COc1ccc([S+](c2ccc(OC)cc2)c2ccc(OC)cc2)cc1

nearest known ligand 0.44

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
PKM P14618 4/20 0.44
RECQL P46063 1/20 0.43
MMP13 P45452 6/20 0.41
MMP8 P22894 2/20 0.41
HTT P42858 1/20 0.41
NPSR1 Q6W5P4 1/20 0.41
MMP1 P03956 5/20 0.40
ALDH1A1 P00352 1/20 0.39
CA1 P00915 2/20 0.39
CA2 P00918 2/20 0.39
MMP2 P08253 1/20 0.39
MMP9 P14780 1/20 0.39
GAA P10253 1/20 0.39
CA9 Q16790 1/20 0.38
NPC1 O15118 1/20 0.38
PKLR P30613 1/20 0.38
RAB9A P51151 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7575503 0.90 PKM (0.50) PKMMMP13MMP8HTTNPSR1
SCHEMBL451242 0.88 MMP13 (0.44) PKMMMP13MMP8MMP1ALDH1A1
SCHEMBL5712580 0.85 PTGS2 (0.43) PKMMMP13MMP8HTTNPSR1
SCHEMBL2902964 0.83 MMP13 (0.40) MMP13MMP8MMP1ALDH1A1MMP2
SCHEMBL3190137 0.83 PTGS2 (0.41) MMP13MMP1ALDH1A1MMP9
SCHEMBL7575945 0.82 PKM (0.54) PKMMMP13MMP8MMP1ALDH1A1
SCHEMBL7574532 0.81 ALDH1A1 (0.41) MMP13MMP8MMP1ALDH1A1CA1
SCHEMBL6652819 0.79 CA12 (0.38) PKMALDH1A1CA2GAACA9
SCHEMBL8317869 0.78 PABPC1 (0.33) MMP13HTTMMP1ALDH1A1MMP2
SCHEMBL7708808 0.77 ALDH1A1 (0.42) NPSR1ALDH1A1CA1CA2GAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020196896-A1 Exposure method, exposure apparatus, X-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-12-26 US disclosed
EP-1193553-A2 Exposure method, exposure apparatus, x-ray mask, semiconductor device and microstructure MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2002-04-03 EP disclosed