SCHEMBL768669

SCHEMBL768669

COc1ccc(/C=C/C(=O)N2CCCCC2)c(OC(=O)OCc2ccccc2)c1

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
APP P05067 4/20 0.55
HPGD P15428 3/20 0.54
HDAC8 Q9BY41 2/20 0.52
PTGS2 P35354 2/20 0.48
TDP1 Q9NUW8 1/20 0.48
SMN1; SMN2 Q16637 3/20 0.48
KDM4E B2RXH2 3/20 0.48
LMNA P02545 1/20 0.48
GAA P10253 1/20 0.48
GPR183 P32249 1/20 0.48
ALDH1A1 P00352 2/20 0.45
MAPT P10636 2/20 0.45
NPC1 O15118 1/20 0.45
RAB9A P51151 1/20 0.45
MEN1 O00255 2/20 0.45
KMT2A Q03164 2/20 0.45
BCHE P06276 2/20 0.44
ACHE P22303 2/20 0.44
MAOA P21397 1/20 0.44
MAOB P27338 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL766041 0.88 APP (0.52) APPHPGDSMN1; SMN2KDM4ELMNA
SCHEMBL10227974 0.84 HPGD (0.53) APPHPGDHDAC8PTGS2TDP1
SCHEMBL13087151 0.81 HPGD (0.53) HPGDPTGS2TDP1SMN1; SMN2KDM4E
SCHEMBL10230139 0.77 TRPV1 (0.58) APPHPGDPTGS2SMN1; SMN2KDM4E
SCHEMBL29449824 0.77 TRPV1 (0.58) APPHPGDPTGS2SMN1; SMN2KDM4E
SCHEMBL10230121 0.76 HPGD (0.52) APPHPGDHDAC8PTGS2TDP1
SCHEMBL16274577 0.74 ALDH1A1 (0.60) HPGDPTGS2TDP1SMN1; SMN2KDM4E
SCHEMBL16274578 0.74 ALDH1A1 (0.60) HPGDPTGS2TDP1SMN1; SMN2KDM4E
SCHEMBL10229069 0.74 PTGS2 (0.48) HPGDPTGS2TDP1SMN1; SMN2KDM4E
SCHEMBL765992 0.73 HPGD (0.46) APPHPGDHDAC8PTGS2TDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME DAI NIPPON PRINTING CO., LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120070781-A1 BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME RER1, SUN2, REV1 APP 906/4885HPGD 861/4885HDAC8 4254/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.