SCHEMBL76913

SCHEMBL76913

CCO[Si](COC(C)=O)(OCC)OCC

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.52
LMNA P02545 1/20 0.52
HSD17B10 Q99714 1/20 0.52
TSHR P16473 1/20 0.43
TDP1 Q9NUW8 1/20 0.35
GAA P10253 2/20 0.33
CHRM5 P08912 2/20 0.33
CHRM1 P11229 2/20 0.33
CHRM3 P20309 2/20 0.33
ALOX15 P16050 1/20 0.33
MGAM O43451 1/20 0.33
SI P14410 1/20 0.33
MGAM2 Q2M2H8 1/20 0.33
PGR P06401 1/20 0.33
CHRM2 P08172 1/20 0.33
CHRM4 P08173 1/20 0.33
HTR1A P08908 1/20 0.33
CHRNB2 P17787 1/20 0.33
TBXA2R P21731 1/20 0.33
CHRNB4 P30926 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1805670 0.82 ALDH1A1 (0.46) ALDH1A1LMNAHSD17B10TSHRGAA
SCHEMBL7931116 0.81 ALDH1A1 (0.35) ALDH1A1LMNAHSD17B10TSHR
SCHEMBL2409855 0.79 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHRGAA
SCHEMBL29631686 0.79 ALOX15 (0.54) ALDH1A1LMNAHSD17B10TSHRGAA
SCHEMBL960528 0.79 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHRGAA
SCHEMBL19770548 0.79 NAAA (0.39) ALDH1A1LMNAHSD17B10TDP1GAA
SCHEMBL1803406 0.79 ALDH1A1 (0.59) ALDH1A1LMNAHSD17B10TSHRTDP1
SCHEMBL80190 0.79 THRB (0.50) ALDH1A1LMNAHSD17B10TSHRTDP1
SCHEMBL3964618 0.77 HCAR2 (0.48) ALDH1A1LMNAHSD17B10RAB9A
SCHEMBL66308 0.77 ALDH1A1 (0.50) ALDH1A1LMNAHSD17B10TSHRTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 362 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025111296-A1 ELECTROLYTE COMPOSITIONS AND ELECTROCHEMICAL DEVICES USING THE SAME II-VI DELAWARE, INC. (US) 2025-05-30 WO claimed
CN-118983520-A Preparation of lithium iron manganese phosphate battery electrolyte 安徽得壹能源科技有限公司 2024-11-19 CN claimed
EP-3986366-B1 COMPOSITION COMPRISING AT LEAST ONE ALKOXYSILANE, AT LEAST ONE NON-AMINO SILICONE AND WATER, THE ALKOXYSILANE/NON-AMINO SILICONE MASS RATIO RANGING FROM 95/5 TO 5/95 OREAL (FR) 2024-09-11 EP claimed
WO-2024172770-A1 PRINTABLE WAX, METHOD OF PRINTING, AND METHOD FOR FLOW VISCOSITY CONTROL AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH (SG) 2024-08-22 WO claimed
CN-117790906-A Additive for lithium ion battery electrolyte and lithium iron manganese phosphate battery electrolyte 昆明理工大学 2024-03-29 CN claimed
US-20240093058-A1 POLYSILAZANE HARD COATING COMPOSITIONS MERCK PATENT GMBH (DE) 2024-03-21 US claimed
CN-114007576-B Anhydrous composition comprising at least one aminosilicone, at least one alkoxysilane and at least one colorant 莱雅公司 2023-12-01 CN claimed
EP-4274866-A1 POLYSILAZANE HARD COATING COMPOSITIONS Merck Patent GmbH (DE) 2023-11-15 EP claimed
CN-115368982-A Anti-reflective coating cleaning and post etch residue removal composition with metal, dielectric and nitride compatibility 恩特格里斯公司 2022-11-22 CN claimed
US-20220331228-A1 ANHYDROUS COMPOSITION COMPRISING AT LEAST ONE AMINO SILICONE, AT LEAST ONE ALKOXYSILANE AND AT LEAST ONE COLORING AGENT L'OREAL (FR) 2022-10-20 US claimed
WO-2007040834-A2 PLURAL TREATMENT STEP PROCESS FOR TREATING DIELECTRIC FILMS TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
WO-2007040856-A2 PLASMA-ASSISTED VAPOR PHASE TREATMENT OF LOW DIELECTRIC CONSTANT FILMS USING A BATCH PROCESSING SYSTEM TOKYO ELECTRON LIMITED (JP) 2007-04-12 WO claimed
US-20070077782-A1 Treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077353-A1 Plasma-assisted vapor phase treatment of low dielectric constant films using a batch processing system TOKYO ELECTRON LIMITED (JP) 2007-04-05 US claimed
US-20070077781-A1 Plural treatment step process for treating dielectric films TOKYO ELECTRON LIMTED (JP) 2007-04-05 US claimed
WO-2006091264-A1 METHOD AND SYSTEM FOR TREATING A DIELECTRIC FILM TOKYO ELECTRON LIMITED (JP) 2006-08-31 WO claimed
US-20050215072-A1 Method and system for treating a dielectric film TOKYO ELECTRON LIMITED (JP) 2005-09-29 US claimed
US-20040166075-A1 Use of an organometallic compound to protect and/or strengthen a keratin material, and treatment process L'OREAL S.A. 2004-08-26 US claimed
US-20030012756-A9 Use of an organometallic compound to protect and/or strengthen a keratin material, and treatment process HILTI AKTIENGESELLSCHAFT (LI) 2003-01-16 US claimed
US-20020041856-A1 Use of an organometallic compound to protect and/or strengthen a keratin material, and treatment process JEANNE-ROSE VALERIE (FR) 2002-04-11 US claimed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040166075-A1 Use of an organometallic compound to protect and/or strengthen a keratin material, and treatment process KRT18, VIM, CDH1 ALDH1A1 4159/4885LMNA 451/4885HSD17B10 4022/4885
US-20030012756-A9 Use of an organometallic compound to protect and/or strengthen a keratin material, and treatment process KRT18, VIM, CDH1 ALDH1A1 4159/4885LMNA 451/4885HSD17B10 4022/4885
US-20220331228-A1 ANHYDROUS COMPOSITION COMPRISING AT LEAST ONE AMINO SILICONE, AT LEAST ONE ALKOXYSILANE AND AT LEAST ONE COLORING AGENT KRT18, SHH, VIM ALDH1A1 1160/4885LMNA 784/4885HSD17B10 2213/4885
US-20020041856-A1 Use of an organometallic compound to protect and/or strengthen a keratin material, and treatment process KRT18, VIM, CDH1 ALDH1A1 4159/4885LMNA 451/4885HSD17B10 4022/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.