Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C9 | P11712 | 2/20 | 0.46 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.46 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.46 |
| ▸ | AMY1A | P0DUB6 | 1/20 | 0.46 |
| ▸ | PTPN1 | P18031 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.40 |
| ▸ | PTPN2 | P17706 | 1/20 | 0.40 |
| ▸ | PTPN6 | P29350 | 1/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.40 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 2/20 | 0.39 |
| ▸ | BCL2 | P10415 | 1/20 | 0.38 |
| ▸ | BCL2L1 | Q07817 | 1/20 | 0.38 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.38 |
| ▸ | USP2 | O75604 | 1/20 | 0.38 |
| ▸ | LMNA | P02545 | 1/20 | 0.38 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.38 |
| ▸ | HSPD1 | P10809 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7939589 | 0.86 | DHFR (0.46) | AMY1A | |
| SCHEMBL7757417 | 0.85 | AMY1A (0.54) | CYP2C9CYP2C19HIF1AAMY1ACYP2D6 | |
| SCHEMBL278275 | 0.85 | MAPT (0.45) | MAPTBCL2BCL2L1 | |
| SCHEMBL29368767 | 0.84 | HSPA5 (0.43) | CYP2C9CYP2C19HIF1AAMY1ACYP3A4 | |
| SCHEMBL35864 | 0.84 | HSPA5 (0.43) | CYP2C9CYP2C19HIF1AAMY1ACYP3A4 | |
| SCHEMBL30320324 | 0.82 | AMY1A (0.69) | CYP2C9CYP2C19HIF1AAMY1ACYP2D6 | |
| SCHEMBL686350 | 0.82 | AMY1A (0.69) | CYP2C9CYP2C19HIF1AAMY1ACYP2D6 | |
| SCHEMBL771058 | 0.80 | SHBG (0.48) | — | |
| SCHEMBL29831656 | 0.80 | SHBG (0.48) | — | |
| SCHEMBL29450504 | 0.77 | BCL2 (0.59) | HIF1ACYP3A4HSD17B10BCL2BCL2L1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0740213-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 2001-08-08 | — | — | EP | disclosed |
| EP-0886183-A1 | Positive-working photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1998-12-23 | — | — | EP | disclosed |
| EP-0744661-B1 | Positive photoresist composition | FUJI PHOTO FILM CO LTD (JP) | 1998-10-07 | — | — | EP | disclosed |
| US-5750310-A | BLEND OF ALKALI SOLUBLE RESIN, 1,2-NAPHTHOQUINONEDIAZIDE SULFONIC ACID AND TETRAHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-12 | — | — | US | disclosed |
| US-5747218-A | NAPHTHOQUINONEDIAZIDE SULFONIC ACID TETRAESTER OF POLYHYDROXYPOLYPHENOLS | FUJI PHOTO FILM CO., LTD. (JP) | 1998-05-05 | — | — | US | disclosed |
| US-5700620-A | POSITIVE PHOTORESIST HAVING HIGH RESOLUTION AND SMALL FILM THICKNESS DEPENDENCE | FUJI PHOTO FILM CO., LTD. (JP) | 1997-12-23 | — | — | US | disclosed |
| US-5667932-A | NAPHTHOQUINONEDIAZIDE SULFONIC ESTER OF POLYHYDROXY COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1997-09-16 | — | — | US | disclosed |
| US-5609982-A | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1997-03-11 | — | — | US | disclosed |
| EP-0744661-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-11-27 | — | — | EP | disclosed |
| EP-0740213-A2 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-10-30 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| US-5340686-A | Alkali soluble phenol novolak resin, 1,2-quinone diazide compound and low molecular weight novolak compound | FUJI PHOTO FILM CO., LTD. (JP) | 1994-08-23 | — | — | US | disclosed |
| EP-0477691-A2 | Positive-type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1992-04-01 | — | — | EP | disclosed |
| EP-0445680-A2 | Positive type photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1991-09-11 | — | — | EP | disclosed |