Aniline

Aniline

SCHEMBL7799247

C(Cc1ccccc1)=Nc1ccccc1.Nc1ccccc1

nearest known ligand 0.42

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.42
MAOB P27338 9/20 0.42
MAOA P21397 5/20 0.42
RAB9A P51151 3/20 0.42
MAPT P10636 3/20 0.42
MEN1 O00255 2/20 0.42
KMT2A Q03164 2/20 0.42
PKM P14618 1/20 0.42
HTT P42858 1/20 0.42
BACE1 P56817 2/20 0.41
GAA P10253 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
L3MBTL1 Q9Y468 1/20 0.36
CYP2C9 P11712 1/20 0.36
IDO1 P14902 2/20 0.34
NOS3 P29474 1/20 0.34
NOS1 P29475 1/20 0.34
NOS2 P35228 1/20 0.34
NPC1 O15118 1/20 0.34
ALDH1A1 P00352 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18947039 0.90 MAOB (0.50) TSHRMAOBMAOAMAPTMEN1
SCHEMBL12136378 0.90 MAOB (0.50) TSHRMAOBMAOAMAPTMEN1
SCHEMBL2342516 0.90 MAOB (0.50) TSHRMAOBMAOAMAPTMEN1
SCHEMBL7590594 0.77 PTGS2 (0.44) TSHRMAOBRAB9AMAPTMEN1
SCHEMBL29220713 0.73 PTGS2 (0.48) TSHRMAOBRAB9AMAPTMEN1
SCHEMBL4466110 0.73 LTA4H (0.52) TSHRMAOBRAB9AMAPTKMT2A
SCHEMBL15055409 0.73 LTA4H (0.52) TSHRMAOBRAB9AMAPTKMT2A
SCHEMBL15055472 0.73 CA2 (0.57) TSHRMEN1KMT2A
SCHEMBL10090559 0.71 ALDH1A1 (0.45) MAOARAB9AMAPTMEN1KMT2A
SCHEMBL7516473 0.71 ALDH1A1 (0.45) MAOARAB9AMAPTMEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed