SCHEMBL7804052

SCHEMBL7804052

O=C([O-])Cl.[Na+]

nearest known ligand 0.00

Known targets — ChEMBL curated mechanism

ABCC8ACEADORA1ADORA2AADORA2BADORA3ALDH5A1ALOX5ALOX5APATP4AATP4BBRAFCA1CA12CA2CA4CYSLTR1DHFRDPEP1EDNRAEDNRBESR2F10FDPSFGF1GABBR1GABBR2GABRA1GABRA2GABRA3GABRA4GABRA5GABRA6GABRB1GABRB2GABRB3GABRDGABREGABRG1GABRG2GABRG3GABRPGABRQGARTGNRHRGSC1HMGCRIMPDH1IMPDH2KCNJ11LY96NOD2NR3C1NS3NS4ANS5bP2RY1P2RY12P2RY2P2RY4P2RY6PBP2XPDE3APDE3BPDE4APDE4BPDE4CPDE4DPDK1PDK2PDK3PDK4PPARGPPATPTGIRPTGS1PTGS2RAF1RYR1RYR3SCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASERPINC1SLC12A1SLC12A3SYKTHRATHRBTLR3TLR4TLR9TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYMSVKORC1XDHblablaIMP-1blaOXA-33blaOXA-58blaT-3blaT-4blaT-5blaT-6dacAdacBdacCfolAfolPfolP1ftsIfusAgaggyrAgyrBmecAmrcAmrcBmrdApbp1apbp1bpbp2pbp2apbp2bpbp3pbp4pbpApbpBpbpCpbpFpolponBrplArplBrplCrplDrplErplFrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmFrpmGrpmHrpmIrpmJrpoArpoBrpoCrpoZrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUykgMykgO

The experimentally established mechanism targets of None. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10851238 0.95
Zinc Ion SCHEMBL6915671 0.89
SCHEMBL11728235 0.89 CA4 (0.46)
SCHEMBL10891180 0.89
SCHEMBL6917485 0.89 CA4 (0.46)
Bicarbonate SCHEMBL9420575 0.89
SCHEMBL11717985 0.89
SCHEMBL6913128 0.89 CA4 (0.46)
SCHEMBL6909188 0.89
SCHEMBL6915448 0.89 CA4 (0.46)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119470408-A Preparation and application of paper-based molecularly imprinted sensor for visually and simultaneously detecting two subtype alphaviruses 湘潭大学 2025-02-18 CN claimed
CN-118874380-A Carboxymethyl starch preparation method and device 山东众友生物科技有限公司 2024-11-01 CN claimed
CN-111362422-B Magnetic complex-cyanide lyase composite nanoparticle, preparation method and application thereof, and method for treating electroplating wastewater by using magnetic complex-cyanide lyase composite nanoparticle 山东普尼奥水处理科技有限公司 2022-05-10 CN claimed
JP-56120867-A None JP disclosed
CN-119736075-A Surfactant for improving recovery ratio and preparation method thereof 大庆市华瑞信化工助剂有限公司 2025-04-01 CN disclosed
CN-119470408-A Preparation and application of paper-based molecularly imprinted sensor for visually and simultaneously detecting two subtype alphaviruses 湘潭大学 2025-02-18 CN disclosed
CN-118874380-A Carboxymethyl starch preparation method and device 山东众友生物科技有限公司 2024-11-01 CN disclosed
CN-117297011-A Functional beverage of stropharia rugoso-annulata and production process thereof 兴文县鲜禾益农业科技开发有限公司 2023-12-29 CN disclosed
CN-111362422-B Magnetic complex-cyanide lyase composite nanoparticle, preparation method and application thereof, and method for treating electroplating wastewater by using magnetic complex-cyanide lyase composite nanoparticle 山东普尼奥水处理科技有限公司 2022-05-10 CN disclosed
CN-110903183-A Novel preparation method of 3,3, 3-trifluoropropionic acid 湖南有色郴州氟化学有限公司 2020-03-24 CN disclosed
US-20010005569-A1 Photosensitive resin composition NANPEI MASARU (JP) 2001-06-28 US disclosed
EP-0398325-B1 Photosensitive resin composition TOYO BOSEKI (JP) 1999-03-10 EP disclosed
US-5424172-A Flexographic printing plate having a photopolymerized image layer comprising a hydrophobic polymers dispersed in a hydrophilic polymer; ink resistance and transfer; durability; aqueous developing TOYO BOSEKI KABUSHIKI KAISHA (JP) 1995-06-13 US disclosed
US-5372913-A Photosensitive resin composition TOYO BOSEKI KABUSHIKI KAISHA (JP) 1994-12-13 US disclosed
EP-0398325-A2 Photosensitive resin composition Toyo Boseki Kabushiki Kaisha (JP) 1990-11-22 EP disclosed
JP-S56120867-A ANTIEARTHQUAKE OPERATING MECHANISM FOR OPENING AND CLOSING VALVE MOTOYAMA SEISAKUSHO:KK 1981-09-22 JP disclosed