Thiouracil

Thiouracil

SCHEMBL7804101

O=c1[nH][nH]c(=O)[nH]1.O=c1cc[nH]c(=S)[nH]1

nearest known ligand 0.79

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Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
▸ TP53 P04637 1/20 0.79
▸ CRBN Q96SW2 1/20 0.52
▸ MMP2 P08253 1/20 0.45
▸ CYP2C19 P33261 2/20 0.37
▸ ALDH1A1 P00352 1/20 0.37
▸ CYP1A2 P05177 1/20 0.37
▸ CYP2C9 P11712 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ TSHR P16473 1/20 0.37
▸ HSD17B10 Q99714 1/20 0.37
▸ SMN1; SMN2 Q16637 2/20 0.33
▸ LPO P22079 1/20 0.33
▸ PTGS1 P23219 1/20 0.33
▸ BAZ2B Q9UIF8 1/20 0.33
▸ TAS2R38 P59533 1/20 0.32
▸ TYMP P19971 1/20 0.31
▸ GSK3B P49841 1/20 0.31
▸ BACE1 P56817 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Thiouracil SCHEMBL546068 0.89 — —
Thiouracil SCHEMBL9172 0.89 — —
Thiouracil SCHEMBL30091289 0.87 — —
Thiouracil SCHEMBL27922231 0.87 — —
Uracil SCHEMBL28120281 0.85 TP53 (0.83) TP53CRBNMMP2CYP2C19SMN1; SMN2
Thiouracil SCHEMBL18815516 0.82 TP53 (0.76) TP53CRBNMMP2SMN1; SMN2LPO
Thiouracil SCHEMBL28095966 0.78 TP53 (0.76) TP53CRBNMMP2CYP2C19ALDH1A1
Thiouracil SCHEMBL27970384 0.78 TP53 (0.76) TP53CRBNMMP2CYP2C19SMN1; SMN2
Thiouracil SCHEMBL28205719 0.76 TP53 (0.73) TP53CRBNMMP2CYP2C19ALDH1A1
Thiouracil SCHEMBL8613383 0.75 TP53 (0.70) TP53CRBNMMP2CYP2C19ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-100367111-C Lithographic gap-filler forming composition NISSAN CHEMICAL IND LTD (JP) 2008-02-06 — — CN disclosed
CN-1440518-A Lithographic gap-filler forming composition NISSAN CHEMICAL IND LTD (JP) 2003-09-03 — — CN disclosed
EP-0823661-B1 Composition for anti-reflective coating material FUJI PHOTO FILM CO LTD (JP) 2001-07-04 — — EP disclosed
US-6248500-B1 ACRYLIC POLYMERS AND PHENOL, NAPHTHOL OR HYDROXYANTHRACENE COMPOUNDS FUJI PHOTO FILM CO., LTD. (JP) 2001-06-19 — — US disclosed
US-6090531-A UNDERGOES NO INTERMIXING WITH THE RESIST LAYER, PROVIDES AN EXCELLENT RESIST PATTERN AND SHOWS A HIGHER DRY ETCHING RATE THAN RESIST AND A RESIST PATTERN FORMATION PROCESS FUJI PHOTO FILM CO., LTD. (JP) 2000-07-18 — — US disclosed
EP-0823661-A1 Composition for anti-reflective coating material FUJI PHOTO FILM CO., LTD. (JP) 1998-02-11 — — EP disclosed
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